Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
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== Process information == | == Process information == | ||
*[[/Standard recipes on the ALD tool|Standard recipes on the ALD tool]] | *[[/Standard recipes on the ALD tool|Standard recipes on the ALD-1 tool]] | ||
*[[/ALD multilayers|Advanced recipes involving fabrication of multilayers]] | *[[/ALD multilayers|Advanced recipes involving fabrication of multilayers]] | ||
*[[/Al2O3 deposition using ALD|Al<sub>2</sub>O<sub>3</sub> deposition using ALD]] | *[[/Al2O3 deposition using ALD|Al<sub>2</sub>O<sub>3</sub> deposition using ALD-1]] | ||
*[[/TiO2 deposition using ALD|TiO<sub>2</sub> deposition using ALD]] | *[[/TiO2 deposition using ALD|TiO<sub>2</sub> deposition using ALD-1]] | ||
*[[/ZnO deposition using ALD|ZnO deposition using ALD]] | *[[/ZnO deposition using ALD|ZnO deposition using ALD-1]] | ||
*[[/AZO deposition using ALD|Al-doped ZnO (AZO) deposition using ALD]] | *[[/AZO deposition using ALD|Al-doped ZnO (AZO) deposition using ALD-1]] | ||
*[[/HfO2 deposition using ALD|HfO<sub>2</sub> deposition using ALD]] | *[[/HfO2 deposition using ALD|HfO<sub>2</sub> deposition using ALD-1]] | ||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||