Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
| Line 58: | Line 58: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Al<sub>2</sub>O<sub>3</sub>: ~ 0.88 - 0.97 nm/cycle (Using the "Al2O3" recipe, depending of the temperature) | *Al<sub>2</sub>O<sub>3</sub>: ~ 0.88 - 0.97 nm/cycle (Using the "Al2O3" recipe, depending of the temperature) | ||
*TiO<sub>2</sub>: | *TiO<sub>2</sub>: 0.04-0.05 nm/cycle | ||
*Pt: Not measured | *Pt: Not measured | ||
|- | |- | ||