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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
 
|-
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,409
|1,399
|2,4%
|3,1%
|12/15 2015
|28/1 2016
|chasil
|chasil
|with HMDS. Average of 3 wafers
|with HMDS. Average of 3 wafers
|-
|-
|Silicon with native oxide
|Silicon with native oxide
|1,399
|1,418
|3,1%
|2,5%
|28/1 2016
|21/2 2016
|chasil
|chasil
|with HMDS. Average of 3 wafers
|with HMDS. Average of 3 wafers
|}
|}


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