Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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* changeable temperature from 20°-200° for III-V materials | * changeable temperature from 20°-200° for III-V materials | ||
* changeable temperature from 20°-200° for other materials | * changeable temperature from 20°-200° for other materials | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | |||
|style="background:LightGrey; color:black"|Substrate size | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
* 50 mm wafers | |||
* 100 mm wafers | |||
* 150 mm wafers | |||
* small pieces down to 3x3 mm2 | |||
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| style="background:LightGrey; color:black"|Allowed materials | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
All cleanroom materials | |||
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|style="background:LightGrey; color:black"|Batch | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
1 | |||
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|} | |||
<br clear="all" /> | |||
==Spin Coater: Manual Standard Resists == | |||
[[Image:Spin coater Manual Labspin in A-5.jpg|300x300px|thumb|Spin coater: Manual Standard Resists in E-5]] | |||
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Standard_Resists click here]''' | |||
The Spin coater: Manual Labspin is a SÜSS Labspin6 coater built into a fumehood. The spin coater is only for standard resists; please consult ''[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|the coater comparison table]]'' for more information. | |||
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=169 LabManager]''' | |||
=== Equipment performance and process related parameters === | |||
{| border="2" cellspacing="0" cellpadding="2" | |||
!style="background:silver; color:black;" align="center" width="60"|Purpose | |||
|style="background:LightGrey; color:black"| | |||
|style="background:WhiteSmoke; color:black"| | |||
*Spin coating UV sensative resists | |||
*Spin coating anisole-based E-beam resits | |||
|- | |||
!style="background:silver; color:black;" align="center" width="60"|Resist | |||
|style="background:LightGrey; color:black"| | |||
|style="background:WhiteSmoke; color:black" align="center"| | |||
* UV sensative resist: AZ5214E, AZMiR701, AZ nLoF 2020 | |||
* E-beam resits: ZEP520A, PMMA, HSQ | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | |||
|style="background:LightGrey; color:black"|Coating thickness | |||
|style="background:WhiteSmoke; color:black" align="center"| | |||
Resist depended see spin curves for differnt resist | |||
|- | |||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | |||
|style="background:LightGrey; color:black"|Spin speed | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
Max. speed: 8000 rpm | |||
|- | |||
|style="background:LightGrey; color:black"|Spin acceleration | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
100 - 5000 rpm/s | |||
|- | |||
|style="background:LightGrey; color:black"|Hotplate temperature | |||
|style="background:WhiteSmoke; color:black" align="center"| | |||
* changeable temperature from 20°-200° | |||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||