Jump to content

Specific Process Knowledge: Difference between revisions

From LabAdviser
Bghe (talk | contribs)
Bghe (talk | contribs)
Line 331: Line 331:
|[[Specific Process Knowledge/Thin film deposition/PECVD| Thin film deposition/PECVD]]
|[[Specific Process Knowledge/Thin film deposition/PECVD| Thin film deposition/PECVD]]
|PECVD
|PECVD
|Deposit SiO2 or Si3N4 doped with P,B and Ge
|Deposition of SiO2 or Si3N4 doped with P,B and Ge
|-
|-
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]]
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]]

Revision as of 14:11, 12 June 2014

2nd Level - Process Topic

Feedback to this page: click here


Choose the process topic you are interested in

The section below here is under construction

Overview of sample processing

Clean the sample File:Cleaning.jpg
Drying Samples File:Drying.jpg
Thermal treatment of the sample File:Thermal treatment 1.jpg
Bonding samples together
Characterize the sample

Overview of sample processing 2

File:Cleaning.jpg
Clean the sample
File:Drying.jpg
Drying Samples
File:Thermal treatment 1.jpg
Thermal treatment of the sample
Bonding samples together
Characterize the sample

Overview of sample processing 3

Clean your sample
Drying your Samples
Thermal treatment of your sample
Bonding your samples together
Characterize your sample