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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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|Deposit SiO2 or Si3N4 doped with P,B and Ge
|Deposit SiO2 or Si3N4 doped with P,B and Ge
|-
|-
|LPCVD
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]]
|
|LPCVD
|Dope with B,P
|Deposition of PolySi doped with B or P
|-
|-
|Ionimplant
|Ionimplant
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