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Specific Process Knowledge/Back-end processing/Laser Micromachining Tool: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Chasil (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
547 edits
Line 138: Line 138:
| Easily break silicon in cristal plan. Depth of the groove : 25µm  
| Easily break silicon in cristal plan. Depth of the groove : 25µm  
|- style="background:LightGray" valign="top"
|- style="background:LightGray" valign="top"
| Silicon 525µm with Si3N4 (150nm to 1,2µm)
| Silicon (525µm) + Si3N4 (150nm to 1,2µm) OR SiO2 (150nm to 320nm)
| Red (1064nm/255mm)
| Red (1064nm/255mm)
| 200 kHz
| 200 kHz
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