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Line 1: Line 1:
{{cc-nanolab}}
{{cc-nanolab}}


'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:taran@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category:Equipment|Lithography exposure]]
[[Category:Equipment|Lithography exposure]]
Line 10: Line 10:
=Mask Aligner vs Maskless Aligner=
=Mask Aligner vs Maskless Aligner=


Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]
In the first half of 2026, a rather thorough investigation of the differences between exposure using mask aligner and maskless aligner was conducted. The result was presented as an advanced lithography tutorial at the 2026 Nordic Nanolab User Meeting in Uppsala, Sweden.
 
Slides presented at NNUM in Uppsala: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]


Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Data from the investigation=
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
<!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]  
 
-->
==AZ 5214E==
<br clear="all" />
===Resolution===
==AZ 5214E==  
<br clear="all" />
===Resolution (AZ 5214E)===
<br clear="all" />
<br clear="all" />
'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:'''
'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:'''
Line 49: Line 53:
<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment:'''
'''SEM images from different exposure equipment for 1.5µm AZ 5214E at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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<br clear="all" />
<br clear="all" />


'''SEM images of different size structures:'''
'''SEM images of different size structures for 1.5µm AZ 5214E:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
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<br clear="all" />
<br clear="all" />


===Yield===
===Yield (AZ 5214E)===


The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
Line 123: Line 127:
! width="460" |  
! width="460" |  


|+'''Wafer maps at optimal processing conditions for different aligners'''
|+'''Wafer maps for 1.5µm AZ 5214E at optimal processing conditions for different aligners'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MLA2_D90_F2.jpg|450px]]
|[[Image:Map_MLA2_D90_F2.jpg|450px]]
Line 140: Line 144:
! width="460" |  
! width="460" |  


|+'''Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|+'''Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MA6-2_hard.jpg|450px]]
|[[Image:Map_MA6-2_hard.jpg|450px]]
Line 156: Line 160:
! width="460" |  
! width="460" |  


|+'''Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
|+'''Wafer maps for 1.5µm AZ 5214E at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MA6-1_hard.jpg|450px]]
|[[Image:Map_MA6-1_hard.jpg|450px]]
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! width="460" |   
! width="460" |   


|+'''Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|+'''Wafer maps for 1.5µm AZ 5214E at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]
|[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]
Line 189: Line 193:
<br clear="all" />
<br clear="all" />


===Resist profile===
===Resist profile (AZ 5214E)===
<br clear="all" />
====Linewidth and sidewall angle vs exposure dose (AZ 5214E)====
<br clear="all" />
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''


====Linewidth and sidewall angle vs exposure dose====
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" | 
 
|+
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|500px]]
 
|- align="center"
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). 
|}
<br clear="all" />
<br clear="all" />


'''SEM images as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
 
'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 230: Line 249:
<br clear="all" />
<br clear="all" />


'''SEM images as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 253: Line 273:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Trenches and Lines
|Trenches <br>and Lines
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
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<br clear="all" />
<br clear="all" />


====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |
! width="510" |  


|+
|+
|- border="0" align="center"
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Profile vs defoc.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|500px]]


|- align="center"
|- align="center"
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
 
|}
|}
<br clear="all" />
<br clear="all" />


====Linewidth and sidewall angle vs defocus parameter====
<br clear="all" />


'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
'''SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 315: Line 336:
<br clear="all" />
<br clear="all" />


'''Result of image analysis of SEM images of 2µm triplets:'''
==AZ MiR 701==
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
<br clear="all" />
! width="510" |
===Resolution (AZ MiR 701)===
 
|+
|- border="0" align="center"
|[[Image:5214E_Profile vs defoc.jpg|500px]]
 
|- align="center"
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
 
|}
<br clear="all" />
<br clear="all" />
==AZ MiR 701==
===Resolution===
* Table with optimal parameters and resolution for different aligners
* SEM pictures
'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
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<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment at optimal processing conditions:'''
'''SEM images of 1.5µm AZ MiR 701 from different exposure equipment at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
Line 388: Line 395:
<br clear="all" />
<br clear="all" />


===Resist profile (sidewall angle and linewidth)===
===Resist profile (AZ MiR 701)===
*SEM pictures to support graphs?
<br clear="all" />
 
====Linewidth and sidewall angle vs exposure dose (AZ MiR 701)====
<br clear="all" />


'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''
Line 404: Line 414:
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).   
|}
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!160mJ/cm<sup>2</sup>
!190mJ/cm<sup>2</sup>
!220mJ/cm<sup>2</sup>
!250mJ/cm<sup>2</sup>
!280mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W18 MA62 MiR vac D160_F8T_04.jpg|280px]]
|[[Image:W18 MA62 MiR vac D190_H6B_03.jpg|280px]]
|[[Image:W18 MA62 MiR vac D220_I3T_03.jpg|280px]]
|[[Image:W18 MA62 MiR vac D250_F3T_03.jpg|280px]]
|[[Image:W18 MA62 MiR vac D280_D5B_03.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W18 MA62 MiR vac D160_F8T_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D190_H6B_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D220_I3T_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D250_F3T_02.jpg|280px]]
|[[Image:W18 MA62 MiR vac D280_D5B_02.jpg|280px]]
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!225mJ/cm<sup>2</sup>
!275mJ/cm<sup>2</sup>
!325mJ/cm<sup>2</sup>
!375mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W15 MLA2 MiR F2 D225_04.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D325_03.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D375_03.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W15 MLA2 MiR F2 D225_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D325_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D375_01.jpg|280px]]
|}
<br clear="all" />
====Linewidth and sidewall angle vs defocus parameter (AZ MiR 701)====
<br clear="all" />
<br clear="all" />


Line 416: Line 497:
|- align="center"
|- align="center"
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc -1
!Defoc 1
!Defoc 2
!Defoc 3
!Defoc 5
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W15 MLA2 MiR F-1 D275_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F1 D275_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|280px]]
|[[Image:W15 MLA2 MiR F3 D275_01.jpg|280px]]
|[[Image:W15 MLA2 MiR F5 D275_01.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W15 MLA2 MiR F-1 D275_02.jpg|280px]]
|
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|280px]]
|
|[[Image:W15 MLA2 MiR F5 D275_02.jpg|280px]]


|}
|}
Line 421: Line 538:


==AZ nLOF 2020==
==AZ nLOF 2020==
===Resolution===
<br clear="all" />
<br clear="all" />
 
===Resolution (AZ nLOF 2020)===
<br clear="all" />
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
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<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment:'''
'''SEM images of 2µm AZ nLOF 2020 from different exposure equipment at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
Line 471: Line 588:
154mJ/cm<sup>2</sup>, vacuum contact
154mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_03.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_04.jpg|400px]]


|-
|-
Line 478: Line 595:
|Aligner: Maskless 01 (MLA1)
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_04.jpg|400px]]


|-
|-
Line 487: Line 604:
450mJ/cm<sup>2</sup>, defoc 0
450mJ/cm<sup>2</sup>, defoc 0
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_??.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_03.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_??.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_02.jpg|400px]]


|}
|}
<br clear="all" />
<br clear="all" />


'''SEM images of different size structures:'''
'''SEM images of different size structures for 2µm AZ nLOF 2020:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
Line 519: Line 636:
220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]


Line 525: Line 642:
<br clear="all" />
<br clear="all" />


===Resist profile (sidewall angle and linewidth)===
'''Cross-sectional SEM images of 2µm AZ nLOF 2020 at optimal processing conditions:'''
*SEM pictures to support graphs?
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-


|-
|-style="background:silver; color:black"
!
!2µm lines
!2µm trenches
!Lines
!Trenches
|-
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:w04_mla1_nLOF_D220_F-4_X_l_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_X_t_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xlines.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xtrench.jpg|340px]]
|}
<br clear="all" />
===Resist profile (AZ nLOF 2020)===
<br clear="all" />
====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


Line 543: Line 686:
<br clear="all" />
<br clear="all" />


'''SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!100mJ/cm<sup>2</sup>
!120mJ/cm<sup>2</sup>
!140mJ/cm<sup>2</sup>
!160mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:w05_ma6_nLOF_D100_vac_2um.jpg|340px]]
|[[Image:w05_ma6_nLOF_D120_vac_2um.jpg|340px]]
|[[Image:w05_ma6_nLOF_D140_vac_2um.jpg|340px]]
|[[Image:w05_ma6_nLOF_D160_vac_2um.jpg|340px]]
|}
<br clear="all" />
'''SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: Maskless 01 (MLA1) using defoc -4:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!200mJ/cm<sup>2</sup>
!220mJ/cm<sup>2</sup>
!240mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:w04_mla1_nLOF_D200_F-4_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D220_F-4_2um.jpg|340px]]
|[[Image:w04_mla1_nLOF_D240_F-4_2um.jpg|340px]]
|}
<br clear="all" />
'''SEM images of 2µm AZ nLOF 2020 as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 0:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!400mJ/cm<sup>2</sup>
!450mJ/cm<sup>2</sup>
!500mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W17 mla2 nLOF D400 F0_01.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|340px]]
|[[Image:W17 mla2 nLOF D500 F0_01.jpg|340px]]
|}
<br clear="all" />
====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)====
<br clear="all" />
'''Result of image analysis of SEM images of 2µm triplets:'''
'''Result of image analysis of SEM images of 2µm triplets:'''


Line 555: Line 771:
|- align="center"
|- align="center"
| colspan="2" | Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF <br>exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup> and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>, respectively. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
| colspan="2" | Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF <br>exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup> and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>, respectively. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
|}
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'''SEM images of 2µm AZ nLOF 2020 as a function of defocus parameter for Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc -14
!Defoc -7
!Defoc -4
!Defoc -1
!Defoc -6
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W06 MLA1 nLOF D220 F-14_02.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-7_01.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-1_01.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F6_02.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg|280px]]
|[[Image:W06 MLA1 nLOF D220 F6_03.jpg|280px]]
|}
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'''SEM images of 2µm AZ nLOF 2020 as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Defoc 0
!Defoc 2
!Defoc 4
|-
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F2_01.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F4_02.jpg|340px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W17 mla2 nLOF D450 F0_03.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F2_02.jpg|340px]]
|[[Image:W17 mla2 nLOF D450 F4_03.jpg|340px]]
|}
|}
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