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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''


[[Category: Equipment|Lithography exposure]]
[[Category:Equipment|Lithography exposure]]
[[Category: Lithography|Exposure]]
[[Category:Lithography|Exposure]]


__TOC__
__TOC__


=Slides presented at NNUM in Uppsala 2026=
=Mask Aligner vs Maskless Aligner=


[[media:MA6 vs MLA 2026_v09.pdf|'''MA6 vs MLA 2026_v09''']]
Slides presented at NNUM in Uppsala 2026: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']]
 
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Additional data=
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==AZ 5214E==
==AZ 5214E==
===Resolution and yield===
===Resolution===
* Aligner: Maskless 02 (MLA2)
'''Resolution at optimal processing conditions for different exposure equipment:'''
* Aligner: MA6-2
{| class="wikitable"
* Aligner: MA6-1
|+
!Exposure equipment
!Dose
!Contact/Defoc
!Resolution
!Comment
|-
|Aligner: MA6-2
|100
|Vacuum
|1µm
|
|-
|Aligner: MA6-1
|100
|Vacuum
|1.25µm
|Probably over-exposed
|-
|Aligner: Maskless 02 (MLA2)
|90
|2
|1.25µm
|
|}
<br clear="all" />
 
'''SEM images from different exposure equipment:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!2µm triplets
!Lines
!Trenches
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
100mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|400px]]
|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|400px]]
|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-1
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_05.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
90mJ/cm<sup>2</sup>, defoc 2
|[[Image:W13 mla2 5214E D90 F2_05.jpg|400px]]
|[[Image:W13 mla2 5214E D90 F2_01.jpg|400px]]
|[[Image:W13 mla2 5214E D90 F2_02.jpg|400px]]
 
|}
<br clear="all" />
 
'''SEM images of different size structures:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!1µm triplets
!2µm triplets
!4µm triplets
|-


===Resist profile (sidewall angle and linewidth)===
|-
[[Image:5214E_Linewidth vs dose.jpg|left|600px|thumb|Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-1
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]]
|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg|400px]]
 
|}
<br clear="all" />
 
===Yield===
 
The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
<br clear="all" />
 
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="460" |
! width="460" |
! width="460" |
 
|+'''Wafer maps at optimal processing conditions for different aligners'''
|- border="0" align="center"
|[[Image:Map_MLA2_D90_F2.jpg|450px]]
|[[Image:Map_MA6-2_vacuum.jpg|450px]]
|[[Image:Map_MA6-1_vacuum.jpg|450px]]
 
|- align="center"
| Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm<sup>2</sup>; defoc 2). <br/>Resolution: 1.22µm average; 0.1µm standard deviation. <br/>Yield at 1.25µm: 99% ||  Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>; vacuum contact). <br/>Resolution: 1.02µm average; 0.1µm standard deviation. <br/>Yield at 1.25µm: 100% || Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>; vacuum contact). Probably over-exposed. <br/>Resolution: 1.30µm average; 0.2µm standard deviation. <br/>Yield at 1.25µm: 59%
|}
<br clear="all" />
 
====Effect of exposure mode for mask aligner====
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="460" |
! width="460" |
! width="460" |
 
|+'''Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|- border="0" align="center"
|[[Image:Map_MA6-2_hard.jpg|450px]]
|[[Image:Map_MA6-2_soft_clean.jpg|450px]]
|[[Image:Map_MA6-2_prox.jpg|450px]]
 
|- align="center"
| Hard contact. <br/>Resolution: 1.17µm average; 0.2µm standard deviation. <br/>Yield at 1.25µm: 89% || Soft contact. <br/>Resolution: 3.77µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 4% || 10µm proximity. <br/>Resolution: 4.19µm average; 0.7µm standard deviation. <br/>Yield at 2.5µm: 3%
|}
<br clear="all" />
 
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="460" |
! width="460" |
! width="460" |
 
|+'''Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm<sup>2</sup>, probably over-exposed)'''
|- border="0" align="center"
|[[Image:Map_MA6-1_hard.jpg|450px]]
|[[Image:Map_MA6-1_soft.jpg|450px]]
|[[Image:Map_MA6-1_prox.jpg|450px]]
 
|- align="center"
| Hard contact. <br/>Resolution: 1.58µm average; 0.5µm standard deviation. <br/>Yield at 1.25µm: 48% || Soft contact. <br/>Resolution: 2.36µm average; 0.4µm standard deviation. <br/>Yield at 2.5µm: 80% <br/>At dose 92mJ/cm<sup>2</sup>, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100% || 10µm proximity. <br/>Resolution: 2.73µm average; 0.6µm standard deviation. <br/>Yield at 2.5µm: 53%
|}
<br clear="all" />


[[Image:5214E_Sidewall vs dose.jpg|left|600px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
====Effect of WEC pressure for mask aligner (after WEC head service)====
<!--
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
{| cellpadding="2" style="border: 2px solid darkgray;" align="center"
! width="350" |  
! width="460" |  
! width="350" |  
! width="460" |


|+'''Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.'''
|+'''Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm<sup>2</sup>)'''
|- border="0" align="center"
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|450px]]
|[[Image:Map_MA6-2_soft_WEC015.jpg|450px]]
|[[Image:5214E_Sidewall vs dose.jpg|450px]]
|[[Image:Map_MA6-2_soft_WEC040.jpg|450px]]


|- align="center"
|- align="center"
| Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). || Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
| Soft contact, 0.15bar WEC pressure. <br/>Resolution: 3.92µm average; 0.9µm standard deviation. <br/>Yield at 2.5µm: 8% || Soft contact, 0.40bar WEC pressure. <br/>Resolution: 2.19µm average; 0.5µm standard deviation. <br/>Yield at 2.5µm: 86%
 
|- border="0" align="center"
|[[Image:Map_MA6-2_prox_WEC015.jpg|450px]]
|[[Image:Map_MA6-2_prox_WEC040.jpg|450px]]
 
|- align="center"
| 10µm proximity, 0.15bar WEC pressure. <br/>Resolution: 3.22µm average; 0.8µm standard deviation. <br/>Yield at 2.5µm: 34% || 10µm proximity, 0.40bar WEC pressure. <br/>Resolution: 2.83µm average; 0.6µm standard deviation. <br/>Yield at 2.5µm: 66%
|}
<br clear="all" />
 
===Resist profile===
 
====Linewidth and sidewall angle vs exposure dose====
 
'''SEM images of 2µm triplets as a function of exposure dose:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!85mJ/cm<sup>2</sup>
!90mJ/cm<sup>2</sup>
!95mJ/cm<sup>2</sup>
!100mJ/cm<sup>2</sup>
!105mJ/cm<sup>2</sup>
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
Vacuum contact
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
 
|}
<br clear="all" />
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!80mJ/cm<sup>2</sup>
!90mJ/cm<sup>2</sup>
!100mJ/cm<sup>2</sup>
!110mJ/cm<sup>2</sup>
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
Defoc 2
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
|[[Image:W13 mla2 5214E D100 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D110 F2_01.jpg|280px]]
 
|}
<br clear="all" />
 
'''Result of image analysis of SEM images of 2µm triplets:'''
 
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" | 
 
|+
|- border="0" align="center"
|[[Image:5214E_Linewidth vs dose.jpg|500px]]
|[[Image:5214E_Sidewall vs dose.jpg|500px]]
 
|- align="center"
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). 
|}
<br clear="all" />
 
====Linewidth and sidewall angle vs defocus parameter====
 
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!Defoc -8
!Defoc -1
!Defoc 2
!Defoc 5
!Defoc 12
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|2µm triplets
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]]
 
|}
<br clear="all" />
 
'''Result of image analysis of SEM images of 2µm triplets:'''
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |
 
|+
|- border="0" align="center"
|[[Image:5214E_Profile vs defoc.jpg|500px]]
 
|- align="center"
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.


|}
|}
-->
<br clear="all" />
<br clear="all" />


==AZ MiR 701==
==AZ MiR 701==
===Resolution===
===Resolution===
* Table with optimal parameters and resolution for different aligners
* SEM pictures
===Resist profile (sidewall angle and linewidth)===
===Resist profile (sidewall angle and linewidth)===
* Aligner: Maskless 02 (MLA2)
*SEM pictures to support graphs?
* Aligner: MA6-2
 
[[Image:MiR_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
 
[[Image:MiR_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
 
[[Image:MiR_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
 
<br clear="all" />


==AZ nLOF 2020==
==AZ nLOF 2020==
===Resolution===
===Resolution===
* Table with optimal parameters and resolution for different aligners
* SEM pictures
===Resist profile (sidewall angle and linewidth)===
===Resist profile (sidewall angle and linewidth)===
* Aligner: Maskless 01 (MLA1)
*SEM pictures to support graphs?
* Aligner: Maskless 02 (MLA2)
 
* Aligner: MA6-2
[[Image:nLOF_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]]
 
[[Image:nLOF_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]]
 
[[Image:nLOF_MLA1_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
 
[[Image:nLOF_MLA2_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
 
<br clear="all" />
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