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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,915 edits
Tag: Manual revert
 
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{{cc-nanolab}}
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Development/Developer_TMAH_UV-lithography_processing click here]'''
[[Category: Equipment|Lithography]]
[[Category: Lithography]]
__TOC__
=General Process Information=
=General Process Information=
Processing on Developer TMAH UV-lithography consists of the following steps:  
Processing on Developer TMAH UV-lithography consists of the following steps:  
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*Puddle development
*Puddle development
*Rinse
*Rinse


'''Features of Developer TMAH UV-lithography:'''
'''Features of Developer TMAH UV-lithography:'''
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'''2.2µm AZ 5214E:''' (image reversal)
'''2.2µm AZ 5214E:''' (image reversal)
*Reversal bake: 60s-120s @ 110°C
*Reversal bake: 60s-120s @ 110°C
*Flood exposure: ~200-500 mJ/cm<sup>2</sup>
*Flood exposure: ~500 mJ/cm<sup>2</sup>
*Development: SP 60s
*Development: SP 60s


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Multiple puddle:
Multiple puddle:
*'''(10??) DCH 100mm MP 3x60s'''
*'''(1019) DCH 100mm MP 3x60s'''
*'''(1010) DCH 100mm MP 4x60s'''
*'''(1010) DCH 100mm MP 4x60s'''
*'''(1012) DCH 100mm MP 5x60s'''
*'''(1012) DCH 100mm MP 5x60s'''
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''Sequence names and process parameters (Sequence no. 3000-3999):''
''Sequence names and process parameters (Sequence no. 3000-3999):''
*'''(3001) DCH 100mm PEB60s@110C+SP60s'''
 
'''(3001) DCH 100mm PEB60s@110C+SP60s'''<br>
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 100mm SP 60s' development.
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 100mm SP 60s' development.
*'''(3005) DCH 100mm PEB60s@110C+SP30s'''
 
 
'''(3005) DCH 100mm PEB60s@110C+SP30s'''<br>
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 100mm SP 30s' development.
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 100mm SP 30s' development.
*'''(3010) DCH 150mm PEB60s@110C+SP60s'''
 
 
'''(3010) DCH 150mm PEB60s@110C+SP60s'''<br>
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 150mm SP 60s' development.
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 150mm SP 60s' development.
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