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==Inclined UV lamp==
{{cc-nanolab}}
[[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]]


The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank.
[[Category: Equipment|Lithography exposure]]
[[Category: Lithography|Exposure]]


The toll was purchased in February 2009 from Newport company. The exposure lamp has a official name: Oriel Flood Exposure Source, unit 92540. All other parts of equipment: inclined substrate and mask holder with media tank, exhaust box around the tool, timer controller, were designed and build at Danchip workshop.
__TOC__


The incleined substrate and mask holder with a media tank was designed as part of Master Thesis of DTU Nanotech
=UV Exposure Comparison Table=
{| class="wikitable"
|-
!
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]
|-
! scope=row| Purpose
|
*Top side alignment
*Back side alignment
*UV exposure
NB: this tool is in PolyFabLab
|
*Top side alignment
*Back side alignment
*UV exposure
*Bond alignment
|
*Top side alignment
*Maskless UV exposure
|
*Top side alignment
*Back side alignment
*Maskless UV exposure
|
*Top side alignment
*Back side alignment
*Maskless UV exposure
|
*Top side alignment
*Maskless UV exposure
*Direct laser writing
NB: this tool is in PolyFabLab
|-
! scope=row| Minimum feature size
| ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm
|-
! scope=row| Alignment accuracy
|
*TSA: ±2 µm
*BSA: ±5 µm
|
*TSA: ±1 µm
*BSA: ±2 µm
|
±2 µm<br>(±1 µm possible)
|
*TSA: ± 0.5 µm
*BSA: ± 1 µm
|
*TSA: ± 0.5 µm
*BSA: ± 1 µm
|
±1 µm
|-
! scope=row| Exposure light source
|
*350 W Hg lamp
*i-line filter (365nm band pass filter)
|
*500 W Hg-Xe lamp
*i-line filter (365nm band pass filter)
|
365 nm LED
|
375 nm laser diode array
|
405 nm laser diode array
|
*365 nm LED
*405 nm laser diode
|-
! scope=row| Exposure mode
|
*Flood exposure
*Proximity
*Contact:
**Soft contact
**Hard contact
**Vacuum contact
|
*Flood exposure
*Proximity
*Contact:
**Soft contact
**Hard contact
**Vacuum contact
|
*Projection:
**Pneumatic auto-focus
|
*Projection:
**Optical auto-focus
**Pneumatic auto-focus
|
*Projection:
**Pneumatic auto-focus
|
*Projection:
**Optical auto-focus
**Pneumatic auto-focus
*Direct laser writing:
**Optical auto-focus
**Pneumatic auto-focus
|-
! scope=row| Batch size
| 1 || 1 || 1 || 1 || 1 || 1
|-
! scope=row| Allowed materials
| All PolyFabLab materials
|
*All cleanroom materials except copper and steel
*Dedicated chuck for III-V materials
| All cleanroom materials
| All cleanroom materials
| All cleanroom materials
| All PolyFabLab materials
|-
|}


=Mask vs Maskless aligners=
Comparison study between mask aligners and maskless aligners can be found [[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA|here]].


=Decommisioned tools=
<span style="color:red">Inclined UV lamp was decommissioned 2023.</span>


 
[[Specific Process Knowledge/Lithography/UVExposure/aligner_inclinedUV|Information about decommissioned tool can be found here.]]
 
 
 
 
 
There are 2 hotplates with temperature range up to 250C, placed in the same fumehood, which can be used for baking before/after spinning.
 
 
'''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:'''
Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=251 LabManager]

Latest revision as of 14:38, 26 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

UV Exposure Comparison Table

Aligner: MA6-1 Aligner: MA6-2 Aligner: Maskless 01 Aligner: Maskless 02 Aligner: Maskless 03 Aligner: Maskless 04
Purpose
  • Top side alignment
  • Back side alignment
  • UV exposure

NB: this tool is in PolyFabLab

  • Top side alignment
  • Back side alignment
  • UV exposure
  • Bond alignment
  • Top side alignment
  • Maskless UV exposure
  • Top side alignment
  • Back side alignment
  • Maskless UV exposure
  • Top side alignment
  • Back side alignment
  • Maskless UV exposure
  • Top side alignment
  • Maskless UV exposure
  • Direct laser writing

NB: this tool is in PolyFabLab

Minimum feature size ~1 µm ~1 µm ~1 µm ~1 µm ~1 µm ~1 µm
Alignment accuracy
  • TSA: ±2 µm
  • BSA: ±5 µm
  • TSA: ±1 µm
  • BSA: ±2 µm

±2 µm
(±1 µm possible)

  • TSA: ± 0.5 µm
  • BSA: ± 1 µm
  • TSA: ± 0.5 µm
  • BSA: ± 1 µm

±1 µm

Exposure light source
  • 350 W Hg lamp
  • i-line filter (365nm band pass filter)
  • 500 W Hg-Xe lamp
  • i-line filter (365nm band pass filter)

365 nm LED

375 nm laser diode array

405 nm laser diode array

  • 365 nm LED
  • 405 nm laser diode
Exposure mode
  • Flood exposure
  • Proximity
  • Contact:
    • Soft contact
    • Hard contact
    • Vacuum contact
  • Flood exposure
  • Proximity
  • Contact:
    • Soft contact
    • Hard contact
    • Vacuum contact
  • Projection:
    • Pneumatic auto-focus
  • Projection:
    • Optical auto-focus
    • Pneumatic auto-focus
  • Projection:
    • Pneumatic auto-focus
  • Projection:
    • Optical auto-focus
    • Pneumatic auto-focus
  • Direct laser writing:
    • Optical auto-focus
    • Pneumatic auto-focus
Batch size 1 1 1 1 1 1
Allowed materials All PolyFabLab materials
  • All cleanroom materials except copper and steel
  • Dedicated chuck for III-V materials
 All cleanroom materials All cleanroom materials All cleanroom materials All PolyFabLab materials

Mask vs Maskless aligners

Comparison study between mask aligners and maskless aligners can be found here.

Decommisioned tools

Inclined UV lamp was decommissioned 2023.

Information about decommissioned tool can be found here.

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