Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*1 50 mm wafer | *1 50 mm wafer | ||
*1 100 mm wafer | *1 100 mm wafer | ||
*1 150 mm wafer | *1 150 mm wafer (exposure area only 125x125 mm<sup>2</sup>) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1 small sample, down to 3x3 mm<sup>2</sup> | *1 small sample, down to 3x3 mm<sup>2</sup> | ||