Specific Process Knowledge/Characterization/XRD/XRD SmartLab: Difference between revisions
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[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager] - requires login | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager] - requires login | ||
'''For XRD SmartLab Users at Nanolab:''' There's a bug in the software in the cleanroom, so the Parts Help doesn't show up with useful information about the optics used in Optical and Sample Alignment when you click the '?'. We copied the Parts Help from the newer XRD Rot Anode so you can the information: | |||
*On the Desktop of the Smartlab computer in the cleanroom | |||
*In the Cleanroom Drive under _Equipment/XRD/PartsHelp_fromXRDRotAnode_SLSII | |||
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* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_MgO#X-Ray_Reflectivity|Sputtered deposited MgO thin films]]. | * Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_MgO#X-Ray_Reflectivity|Sputtered deposited MgO thin films]]. | ||
* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium/Sc_Sputtering_in_Cluster_Lesker_PC3#X-ray_Reflectivity_(XRR)|Sputtered deposited Sc thin films]]. | |||
* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium_Nitride/ScN_Reactive_Sputtering_in_Cluster_Lesker_PC3#X-ray_Reflectivity_(XRR)|Sputtered deposited ScN thin films]]. | |||
<!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].--> | <!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].--> | ||
==Grazing Incidence X-ray Diffraction XRD (GiXRD)== | |||
* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in GiXRD|Instrumental broading in GiXRD]]. | |||
==θ/2θ X-ray Diffraction== | |||
* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in T2T|Instrumental broadening in symmetrical θ/2θ measurements]]. | |||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||