Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions

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 '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_TEOS) click here]'''
-<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>
 [[Category: Equipment|Thin film LPCVD TEOS]]
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 More information about the TEOS oxide deposition process can be found here:
-[[Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD|Deposition of TEOS oxide using LPCVD]]
+[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS|Deposition of TEOS oxide using LPCVD]]
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 ==Overview of the performance of the LPCVD TEOS furnace and some process related parameters==
-{| border="2" cellspacing="0" cellpadding="0"
+{| border="2" cellspacing="0" cellpadding="10"
 |-
-!style="background:silver; color:black;" align="center"|Purpose
+!colspan="2" border="none" style="background:silver; color:black" align="center"|Purpose
-|style="background:LightGrey; color:black"|
+|style="background:LightGrey; color:black"|'''Deposition of TEOS oxide'''
-|style="background:WhiteSmoke; color:black"|
-Deposition of TEOS oxide
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 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance