Specific Process Knowledge/Characterization/XPS/Nexsa: Difference between revisions
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The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique. | The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique. | ||
[[Image: | [[Image:XPS Nexsa instrument.jpg |thumb|300px|The XPS Nexsa.]] | ||
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*[[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]] | *[[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]] | ||
*[[Specific Process Knowledge/Characterization/XPS/UPS technique|Ultraviolet Photoelectron Spectroscopy or UPS]] | *[[Specific Process Knowledge/Characterization/XPS/UPS technique|Ultraviolet Photoelectron Spectroscopy or UPS]] | ||
*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview|Table with a set of publications in which multiple techniques are used]] | |||
'''Specific measurements''' | '''Specific measurements''' | ||
The Nexsa will allow you to characterize the sample in many ways. The list of parameters that can be determined are: | |||
The Nexsa | ; Work function | ||
; Work function | |||
: Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information. | : Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information. | ||
; Band gap measurements | ; Band gap measurements | ||
: | : Based on the REELS spectra the band gap may be determined. | ||
; | ; Electronic band structure | ||
: Using Angle resolved XPS (ARXPS) and UPS (ARUPS) the electronic band structure may be mapped. | |||
== Getting access to the XPS == | == Getting access to the XPS == | ||