Specific Process Knowledge/Characterization/XPS/Nexsa: Difference between revisions
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The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique. | The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique. | ||
[[Image: | [[Image:XPS Nexsa instrument.jpg |thumb|300px|The XPS Nexsa.]] | ||
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'''Check out the alternative techniques!''' | '''Check out the alternative techniques!''' | ||
It is clearly in everybody's interest that the techniques are explored - that we throw all kinds of samples at them and that we investigate what kind of knowledge we can extract. Ideally, all this knowledge that we | It is clearly in everybody's interest that the techniques are explored - that we throw all kinds of samples at them and that we investigate what kind of knowledge we can extract. Ideally, all this knowledge that we acquire should be shared among all the users. We therefore strongly urge you to take a look at the techniques on the pages listed below. Here, we will collect technical information and publications so that, hopefully, you will get inspired to explore the techniques with all kinds of samples. | ||
*[https://xpssimplified.com/whatisxps.php XPSsimplified - The Thermofisher web page on all the Nexsa techniques] | |||
*[[Specific Process Knowledge/Characterization/XPS/XPS technique|The XPS technique]] | *[[Specific Process Knowledge/Characterization/XPS/XPS technique|The XPS technique]] | ||
*[[Specific Process Knowledge/Characterization/XPS/ISS|Ion Scattering Spectroscopy or ISS]] | *[[Specific Process Knowledge/Characterization/XPS/ISS|Ion Scattering Spectroscopy or ISS]] | ||
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*[[Specific Process Knowledge/Characterization/XPS/UPS technique|Ultraviolet Photoelectron Spectroscopy or UPS]] | *[[Specific Process Knowledge/Characterization/XPS/UPS technique|Ultraviolet Photoelectron Spectroscopy or UPS]] | ||
*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview|Table with a set of publications in which multiple techniques are used]] | *[[Specific Process Knowledge/Characterization/XPS/NexsaOverview|Table with a set of publications in which multiple techniques are used]] | ||
'''Specific measurements''' | |||
The Nexsa will allow you to characterize the sample in many ways. The list of parameters that can be determined are: | |||
; Work function | |||
: Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information. | |||
; Band gap measurements | |||
: Based on the REELS spectra the band gap may be determined. | |||
; Electronic band structure | |||
: Using Angle resolved XPS (ARXPS) and UPS (ARUPS) the electronic band structure may be mapped. | |||
== Getting access to the XPS == | == Getting access to the XPS == | ||