Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD

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Recipe Dep. rate [nm/min] RI Unif. [%] Stress [MPa] Comments SiH4 [sccm] N2 [sccm] B2H6 PH3 Pressure [mTorr] Power [W] Load Tune Time [mm:ss] Tested


aSi_1 ~6 nm/min ? ? ? 100 0 200 mTorr 10HF From logbook June 2019
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