Specific Process Knowledge/Thin film deposition/Deposition of Scandium

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Deposition of Scandium

Deposition of Sc can only be done by sputtering using 4-inch Sc target.

The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:

• Deposition of Scandium (Sc) using sputtering in Sputter-System Metal-Nitride(PC3) Source 1 (4-inch target)

At the moment (October 2023) we have a 4-inch Sc target (0.250" thick bonded to Cu) for PC3 Src1.