Specific Process Knowledge/Pattern Design/Travka

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The Travka mask set

The travka mask set consists of 7 masks:

Travka 05 with L-Edit design file: File:Travka 05.tdb and cif file File:Travka 05.cif
Travka 10 with L-Edit design file: File:Travka 10.tdb and cif file File:Travka 10.cif
Travka 20 with L-Edit design file: File:Travka 20.tdb and cif file File:Travka 20.cif
Travka 35 with L-Edit design file: File:Travka 35.tdb and cif file File:Travka 35.cif
Travka 50 with L-Edit design file: File:Travka 50.tdb and cif file File:Travka 50.cif
Travka 65 with L-Edit design file: File:Travka 65.tdb and cif file File:Travka 65.cif
Travka 80 with L-Edit design file: File:Travka 80.tdb and cif file File:Travka 80.cif

The numbers in the end of the mask names refer to the average exposed area of a positive photolithography process. The masks are designed for characterisation of dry etches and holds a number of 1x1 or 1x2 cm fields. The positions of these fields are the same on all masks.

Each field has a number of features (for instance trenches of variable widths) distributed in such a way that the exposed area within the field corresponds to value for each mask.

Below is shown the field distribution on a 4 inch wafer. Click on the links in the figure to find more information on the individual fields.

**Field distribution**
Dummy	Dummy	A-circle	PilCav	Dektak	PilCav	A-circle	Dummy	Dummy
Dummy	PilCav	A-square	Filmtek	ASE	Filmtek	A-square	Deskew	Dummy
T-ridge		A-line		Dektak	T-ridge		A-line
Filmtek	PilCav	A-circle	Filmtek	ASE	Filmtek	A-circle	PilCav	Filmtek
Dektak	ASE	Dektak	ASE	Dektak	ASE	Dektak	ASE	Dektak
Filmtek	PilCav	A-circle	Filmtek	ASE	Filmtek	A-circle	PilCav	Filmtek
A-line		T-ridge		Dektak	A-line		T-ridge
Dummy	Deskew	A-square	Filmtek	ASE	Filmtek	A-square	PilCav	Dummy
Dummy	Dummy	A-circle	PilCav	Dektak	PilCav	A-circle	Dummy	Dummy