Specific Process Knowledge/Lithography/Development/6inch developer
Developer-6inch
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This equipment will be decommissioned December 2019!
The Developer: 6inch bench is an automated developer bath for submersion development of AZ 5214E and AZ 4562 resists in AZ 351B developer. The developer is mixed 1:5 in water by the equipment prior to development start. The developer is circulated during development, and the wafer cassette may be agitated by a mechanical elevator. The development time is controlled manually by the user. After development, the substrates are rinsed with water in the bench.
The user manual, user APV, and contact information can be found in LabManager
Process information
Standard development time:
AZ 5214E:
- 1.5µm resist: 60 sec
- 2.2µm resist: 70 sec
- 4.2µm resist: 3 min
AZ 4562:
- 10µm resist: 5 min
| Purpose |
Development of
| |
|---|---|---|
| Developer |
AZ 351B diluted 1:5 in water (NaOH and sodium borate salt) | |
| Method | Development |
Submersion |
| Handling |
Cassette | |
| Process parameters | Temperature |
22°C |
| Agitation |
Circulation and mechanical | |
| Rinse |
DI water | |
| Substrates | Substrate size |
|
| Allowed materials |
Silicon, glass, and polymer substrates Film or pattern of all types | |
| Batch |
1-25 |