File:Doped poly.pdf
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Recipe "DOPEPOLY" Deposition time : 30 minutes Polysilicon thickness :104 nm Substrate : 110nm Silicon dioxide on N-type si(100)
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current | 11:25, 11 February 2015 | 809 × 584 (32 KB) | Paphol (talk | contribs) | ||
10:50, 11 February 2015 | No thumbnail | (18 KB) | Paphol (talk | contribs) | Recipe "DOPEPOLY" Deposition time : 30 minutes Polysilicon thickness :104 nm Substrate : 110nm Silicon dioxide on N-type si(100) |
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