Specific Process Knowledge/Lithography/Development/1and2 developer
Developer-1 and Developer-2
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This equipment was decommissioned January 2017!
Developer-1 and Developer-2 are manual developer baths for submersion development of AZ 5214E and AZ 4562 resists in AZ 351B developer. The developer is mixed 1:5 in water by the user prior to development start, and the wafer cassette is agitated manually by the user during development. The development time is controlled manually by the user. After development, the substrates are rinsed with water in the bench.
The user APV, and contact information can be found in LabManager: Developer-1 Developer-2
Process information
Standard development time using vigorous agitation:
AZ 5214E:
- 1.5µm resist: 60 sec
- 2.2µm resist: 70 sec
- 4.2µm resist: 3 min
AZ 4562:
- 10µm resist: 5 min
Standard development procedure:
- Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems.
- The main rule is a developer made yesterday must be changed.
- During development, agitate the substrates by moving the carrier up and down.
- Rinse substrates with water for 4-5 min. after development.
- Spin-dry substrates or dry with nitrogen gun after rinsing.
Procedure for making a new developer
1. Switch off the heater, and dump the old developer.
2. 800ml "Developer AZ 351B" is mixed with 4000ml water in a special container in the fume hood.
3. Fill the bath with the developer mixture, and heat it to 22°C before use.
| Purpose |
Development of
| |
|---|---|---|
| Developer |
AZ 351B diluted 1:5 in water (NaOH and sodium borate salt) | |
| Method | Development |
Submersion |
| Handling |
Cassette | |
| Process parameters | Temperature |
22°C |
| Agitation |
Manual | |
| Rinse |
DI water | |
| Substrates | Substrate size |
|
| Allowed materials |
Silicon, glass, and polymer substrates Film or pattern of all types | |
| Batch |
1-8 |