Specific Process Knowledge/Thin film deposition/Deposition of Scandium

From LabAdviser
< Specific Process Knowledge‎ | Thin film deposition
Revision as of 12:56, 9 November 2023 by Eves (talk | contribs) (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium&action=submit click here]''' <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> == Deposition of Scandium == Deposition of Sc can only be done by sputtering using 4-inch Sc target. The only tool for this applicatio...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Feedback to this page: click here

Unless otherwise stated, this page is written by DTU Nanolab internal

Deposition of Scandium

Deposition of Sc can only be done by sputtering using 4-inch Sc target.

The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:

At the moment (October 2023) we have a 4-inch Sc target (0.250" thick bonded to Cu) for PC3 Src1.

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium&oldid=48305"