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Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/Images SiO2RIE

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Revision as of 16:04, 17 January 2023 by Bghe (talk | contribs) (Created page with "=Some images from the DOE experiments= Some of the images are with the resist still on and some are after a plasma ashing where the redeposition on the resist wall are clearly less behind. 400px|thumb|experiment no. 1|")
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Some images from the DOE experiments

Some of the images are with the resist still on and some are after a plasma ashing where the redeposition on the resist wall are clearly less behind.

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