Helios 5 Hydra UX DualBeam

Reading Materials

Resolution

Electron beam:
- At optimum WD: 0.7 nm at 1 kV • 1.0 nm at 500 V (ICD)
- At coincident point: 0.6 nm at 15 kV • 1.2 nm at 1 kV

Xe Ion beam resolution at coincident point:
- <20 nm at 30 kV using preferred statistical method
- <10 nm at 30 kV using selective edge method

Attachments

- MultiChem Gas Injection System (GIS) for W and Pt both E and I beams. C deposition E beam only. XeF2 and H2O etching Ion beam only.

- Thermo Scientific EasyLift™ NanoManipulator for precise in situ sample manipulation

- EBSD

- EDS detector

- Integrated plasma cleaner

May have: (need to check)

- Thermo Scientific CryoCleaner Decontamination Device

- WDS

To find the basic instructions for operating the instrument, the reader is referred to the labmanager manual.