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Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD

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Recipe	Dep. rate [nm/min]	RI	Unif. [%]	Stress [MPa]	Comments	SiH4 [sccm]	N2 [sccm]	B2H6	PH3	Pressure [mTorr]	Power [W]	Load	Tune	Time [mm:ss]	Tested
aSi_1	~6 nm/min	?	?	?		100	0			200 mTorr	10HF				From logbook June 2019

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