Specific Process Knowledge/Thin film deposition

3rd Level - Material/Method

Feedback to this page: click here

Choose material to deposit

Dielectrica	Semicondutors	Metals	Nitrides	Alloys	Transparent conductive oxides	Polymers
Silicon Oxide Titania (TiO2, Titanium Oxide) Alumina (Al2O3, Aluminium Oxide) Tantalum (Ta2O5, Tantalum pentoxide) Chromia (Cr2O3, Chromium Oxide) Hafnium Oxide	Silicon Germanium Zinc Oxide (ZnO)	Aluminium Chromium Cobalt Copper Gold Iron Magnesium Molybdenum Nickel Niobium Palladium Platinum Ruthenium Silver Tantalum Tin Titanium Tungsten Zinc	Silicon Nitride - and oxynitride Titanium Nitride - ceramic Aluminum Nitride (AlxNy)	TiW alloy (10%/90% by weight) NiV alloy AlCu CoFe CuTi FeMn MnIr NiCo NiFe YSZ (Yttrium stabilized Zirconium)	ITO (Tin doped Indium Oxide) AZO (Aluminum doped Zinc Oxide)	SU-8 Antistiction coating Topas PMMA

Choose deposition equipment

PVD	LPCVD	PECVD	ALD	Coaters	Others
Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3) - Cluster-based multi-chamber high vacuum sputtering deposition system Lesker - Sputter tool Wordentec - E-beam evaporator, sputter and thermal evaporator Thermal evaporator E Beam Evaporator (Temescal) Physimeca - E-beam evaporator IBE/IBSD Ionfab 300 - Sputter deposition of high quality optical layers and milling/etching Sputter coater 03 - Gold sputtering system Sputter coater 04 - Gold sputtering system	Furnace LPCVD Nitride (4" and 6") - Deposition of silicon nitride Furnace LPCVD Polysilicon (4" and 6") Deposition of polysilicon Furnace LPCVD TEOS (4") - Deposition of silicon oxide	PECVD - Plasma Enhanced Chemical Vapor deposition Black Magic PECVD - Black Magic PECVD (Carbon) Seki Diamond CVD - Microwave Plasma CVD for diamond Growth	ALD1 - Atomic Layer Deposition (thermal) ALD2 (PEALD) - Atomic Layer Deposition (thermal and plasma enhanced)	See the Lithography/Coaters page for coating polymers	MVD - Molecular Vapor Deposition Electroplating-Ni - Electrochemical deposition of nickel Electroplating-Cu - Electrochemical deposition of copper MOCVD - Epitaxial growth - Ask the department of photonics if you are interested: Elizaveta Semenova or Kresten Yvind