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Courses

We are building up a number of courses to educate our users in using the cleanroom facility and the equipment inside. Below you can see the courses that are presently running. The "Cleanroom introduction Course" is mandatory for all users that need to enter the cleanroom facility on their own. Then there is a number of TPT's (Tool Package Training Courses) that you need to attend depending on which kind of tool you need to use inside the facility.

The Cleanroom Introduction Course

For information regarding the Introduction Course, please take a look at the DTU Danchip homepage, a direct link is given here: [1]


The Lithography TPT

DTU Danchip offers a Tool Package Training in Lithography; the course includes theory on lithographic processes and equipment, as well as training in equipment operation and processing in the cleanroom.

The course is for all users that intend to perform any kind of lithographic processing in the cleanroom, and is a prerequisite for training in other lithography equipment.


Lithography Tool Package Training
Schedule

Theoretical part

  • Lecture videos that can be viewed at one's leisure.
  • A 1 hour "questions and exercises" session 2 times a month (typically Fridays 09:30-10:30).
  • Sign up via Q&E session Doodle

Practical part

  • A 3-4 hour training session 2 times a month, max. 4 persons per session (typically Wednesdays 09:00 - 12:30 or 10:00 - 13:30).
  • Sign up via Training session Doodle
Location

Theoretical part

  • The location of the "questions and exercises" session is room 121A in building 345C.

Practical part

  • The training session takes place inside the cleanroom. The meeting point will be in front of the first equipment.
Qualified Prerequisites
  • Cleanroom safety course at DTU Danchip
  • Admission to the cleanroom must be obtained before the training session
  • Theoretical part must be completed before the training session.
Preparations

Before the "questions and exercises" session

Before training session

  • Complete the theoretical part (Q&E)
  • Watch the training videos of spin coating (automatic), exposure (operation + alignment), and development (automatic).
  • Study the equipment manuals. The manuals are available in LabManager.
  • Study the TPT process flows (first print + alignment).

Links to literature, lecture videos, training videos, equipment manuals, and process flows can be found in the section below.

Course Responsible

The Lithography Group at DTU Danchip lithography@danchip.dtu.dk.

Sign up for the course using Doodle (links under schedule).

Learning Objectives
  • Describe fundamental parts of lithographic processing in a cleanroom, design of process flows
  • Authorization to use spin coater, mask aligner, and developer at DTU Danchip
  • Calculate relevant process parameters
  • Analyze and apply your results of lithographic processing


Material for preparations and further information

Literature


Lecture videos
7 videos, 2:41 hours in total


Lecture slides

Training videos
On YouTube:

On DTU Podcasts:


Manuals


Process Flows


The Mask Design TPT

DTU Danchip offers a Tool Package Training in Mask Design. The course is for all users who intend to design their own masks for lithography.

For instructions please download the exercise for the design program you want to learn:

Mask Design Training
Schedule
  • Self-study using screen cast videoes demonstrating the use of either CleWin og L-edit.
  • An exercise where you are guided through the design of a mask.
  • All materials are provided below.
  • An optional ½ hour Q&A session with an expert on mask layout. You can make an appointment after finishing the exercise.
Location
  • Anywhere you like. DTU network access required.
Qualified Prerequisites
  • Basic knowledge about micro-lithography
  • Access to a computer where you can install Clewin or L-edit
    • Danchip provide free access to use Clewin 5 through a network license.
    • If you want to use L-edit you will need a valid license of your own
  • Basic knowledge about micro-fabrication techniques
Preparations

None

Course Responsible

Customer support at DTU Danchip.

If you have questions you can contact us by e-mailing danchipsupport@danchip.dtu.dk.

Learning Objectives
  • Get acquainted with either Clewin 5 or L-edit mask design programs
  • construct and manipulate basic shapes (rectangles, polygons, circles etc.)
  • use mask layers and hierarchical mask design
  • choose mask polarity and orientation for different resist types and Front/Back-side alignment
  • select and design appropriate test structures and alignment marks for a process
  • make a chip/wafer layout usable for dicing
  • export the layout to cif or gds files with appropriate layer names
  • make a mask order


Material for the Mask Design course

Literature

Training videos

Exercises


The Dry Etch TPT

DTU Nanolab offers a Tool Package Training in dry etching; the course includes theory on dry etching and equipment, as well as training in equipment operation in the cleanroom.

The course is for all users who intend to perform any kind of plasma dry etching in the cleanroom, and is a prerequisite for training in any of the plasma dry etch equipment's.


Dry Etch Tool Package Training
Schedule

Theoretical part

  • A 3-hour lecture. The lecture is on videos. the videos can be found on YouTube, see link below. You can also find the slides with notes below. It can be helpful to print out the lecture slide for your notes and questions while watching the videos. After seeing the videos you must attend a Question&Evaluation session (1-1½ hour), max. 3 persons per session, Please sign up via: Dry Etch TPT Lecture doodle. The Question&Evaluation session takes place in room: 347-078

Practical part

  • A 2 hour training session, max. 3 persons per session will be planed after the Question&Evaluation session.
Location

Theoretical part (the question&evaluation session)

  • Room: 347-R078

Practical part

  • The training session takes place inside the cleanroom. The meeting point will be in The gowning area.
Qualified Prerequisites
  • Cleanroom safety course at DTU Nanolab
  • Admission to the cleanroom must be obtained before the training session
Preparations

Before the Question&Evaluation session

  • Watch the lecture videos, see link to the videos below.
  • If you are not familiar with dry etching we advice you to read through the "Lecture slides with explanatory text included" File:TPT Dry etching April2018 with notes.pdf before watching the videos.

Before training session

  • Watch the training video: TPT hands-on intro
  • Watch the screen cast video's for the ASE/AOE software
  • Watch the screen cast video's for the DRIE/ICP metal and III-V ICP

These are on YouTube and you can find a link to the videos below

Course Responsible

The Dry Etch Group at DTU Nanolab

  • Jonas Michael-Lindhard
  • Berit Herstrøm

If you have questions you can contact us by e-mailing dryetch@danchip.dtu.dk.

Learning Objectives
  • Know why and when to use dry etching
  • Use the dry etchers without harming the machines
  • Select the right instrument to use for his/her dry etch processing
  • Select an appropriate etch recipe for his/her dry etch processing
  • Spot when the recipe needs to be tuned for his/her needs and
  • Suggest relevant tuning parameters


Material for preparations and further information

Literature

  • No extra Literature at the moment

Slides from Lecture

Lecture videos
(Watch before the question and evaluation session)

Pre hands-on training videos
(Watch before the hands-on training)


The SEM TPT

DTU Nanolab offers a Tool Package Training in Scanning electron microscope (SEM); the course includes theory on SEM, as well as training in instrument operation.

The course is for all users who intend to perform any kind of SEM related process and is a prerequisite for training in any of the SEM at Danchip.

SEM Tool Package Training
Schedule

Theoretical part


Practical part

  • A 2-hour training session, max. 3 persons per session will be planed after the lecture
  • A 2-hour one-on-one hands-on session which will request the participant to pass a “driving test” on the SEM. In this session, the participant will have the opportunity to study their own sample
Location

Theoretical part

  • The location of the lecture will be notified after you have signed up

Practical part

  • The training session takes place building 346 room 907(basement). The meeting point will be at the SEM Supra 1
Qualified Prerequisites
Preparations

Before the lecture

  • Read “Scanning Electron Microscopy Primer” by Bob Hafner and some notes that lists some differences between the SEMs described in the primer and the SEMs at Danchip. You can find it on the cleanroom drive: U:\DCH\CleanroomDrive\_TPT\TPT SEM\Learning material, or the primer can be found here

Before the first group training session

Before the one-on-one hands-on

Course Responsible

The SEM Group at DTU Danchip (SEM@danchip.dtu.dk).

Sign up for the course by e-mailing to sem@danchip.dtu.dk.

Learning Objectives
  • Prepare samples and safely operate SEM
  • Understand possibilities and limitations of SEM
  • Explain SEM electron optics and detectors
  • Optimize and analyse SEM images


Slides from the lecture



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Thin Film TPT

DTU Nanolab offers a Tool Package Training (TPT) course in thin film growth and deposition techniques.

Users that have to use any thin film growth and deposition tools in the cleanroom will have to attend the lectures at some point during their course or work in the cleanroom.

Thin film tool package training (TPT)
Schedule

Theoretical part

1st lecture (2 hours)

  • An introduction to thin films
  • Material properties
  • Overview of different thin film techniques at DTU Nanolab – 1st part:
    • Thermal oxidation
    • Electroplating

Check the date for when the next lecture will be held and sign up here: https://danchip.doodle.com/poll/k4pdm2n4bpseww5e

2nd lecture (3 hours)

  • Vacuum basics
  • Overview of different thin film techniques at DTU Nanolab – 2nd part:
  • PVD (physical vapour deposition)
    • E-beam evaporation
    • Thermal evaporation
    • Sputtering
  • CVD (chemical vapour depostion)
    • LPCVD
    • PECVD
  • ALD (atomic layer deposition)

Check the date for when the next lecture will be held and sign up here: https://danchip.doodle.com/poll/4r3ydwzzbrdepgpf

Practical part

  • None
Location

Theoretical part

  • The location of the lecture will be notified after you have signed up
Qualified prerequisites

None

Preparations

None

Course responsible

The Thin Film group at DTU Nanolab (thinfilm@nanolab.dtu.dk).

Learning goals
  • Be aware of relevant material properties for thin films made in the cleanroom
  • Understand importance of correct process pressure (for vacuum processes)
  • Understand different thin film techniques
  • Compare and be able to select appropriate thin film technique

Slides from the lectures


Slides from lecture 1

Slides from lecture 2

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