A symmetric chuck that handles up to 210mm wafers and 15mm thick
An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample.
A symmetric chuck that handles up to 210mm wafers and 15mm thick
Holders
Magnetic sample holder + magnetic discs + double sided tape
Holder for vertical profile scans
Magnetic sample holder + magnetic discs + double sided tape
Holder for vertical profile scans ?
Modes included
ScanAsyst
TappingMode (air)
Contact Mode
Lateral Force Microscopy
Phase Imaging
Lift mode
MFM
Force Spectroscopy
Force volume
EFM
surface potential
Torsional Resonance Mode
Piezoresponse Microscopy
Force spectroscopy
Extra modes:
PeakForce KPFM package (incl extra box for high voltage PF KPFM)
PFQNM package
Microscope Image Registration and Overlay (MIRO) software. this is only working in the old software (before version 9.4)
ScanAsyst
TappingMode (air)
Contact Mode
Lateral Force Microscopy
Phase Imaging
Lift mode
MFM
Force Spectroscopy
Force volume
EFM
surface potential
Torsional Resonance Mode
Piezoresponse Microscopy
Force spectroscopy
Probes that followed the systems
ScanAsyst mode
Tapping mode
Contact mode
PF-KPFM
ScanAsyst air 30ps
ScanAsyst fluid 10ps
ScanAsyst fluid + 10ps
MPP-11100-10
MPP-21100-10
MPP-11120-10 RTESPA
TESPA-V2 10ps
OTESPA-R3 10ps
High Aspect ratio probes 1:15: FIB6-400A 5ps
MPP-12120 10ps. Tap150A
MPP-13120-10 TAP525A
SNL-10 20ps
SCM-PIT 10ps
PFQNE-Al 10ps
ScanAsyst mode
Tapping mode
Contact mode
ScanAsyst air 20ps
ScanAsyst fluid 10ps
ScanAsyst fluid + 10ps
RTESP-300 (like MPP-11100-10)
RFESP-75 (like MPP-21100-10)
TESPA-V2 10ps
OTESPA-R3 10ps
NCHV 10ps
SNL-10 20ps
Samples
QC grid: VGRP-15M 10µm pitch and depth reference 178nm
PF KPFM-SMPL Kelvin probe Sample: Al + Au on Si
HOPG: Highly Oriented Pyrolytic Graphite
Calibration samples for getting quantitative modulus measurements:
PDMS-soft-1-12M: PDMS gel 2.5MPa
PDMS-soft-2-12M: PDMS gel 3.5MPa
PSFilm-12M: Polystyrene filem
FSilica-12M: Fused Silica
Sapphire-12M: Sapphire
RS-12M: Ti roughness sample
HOPG-12M: Highly Orientated Pyrolytic Graphite
PS-LDPE: Harmonix training
QC grid: VGRP-15M 10µm pitch and depth reference 181nm
HOPG: Highly Oriented Pyrolytic Graphite
AFM Icon-Pt 1: Acceptance tests done
Noise tests
Sensor noise
Tappingmode, OTESPA-R3 probe used.
First we made a false engage (scanning in air):
Turn off gain 0 0
Z range 0.2my
Scan size 0.01nm
We saw some 50Hz noise (electrical - or maybe pumps): Rq 15 pm (specs 35pm)
System noise
Noise on sample: scan size 0.1nm
we started with 1my scan size to optimize the scan.
2.43Hz
256 lines
Z range at 2my to get sub nanometer resolution in Z
Rq: 54,5pm (plade vibrator koerte udenfor)
Rq: 23pm uden vibrator koerende + ro og med aaben hood.
Rq:71pm uden vibrator koerende + ro og med lukket hood
Roughness
HAR: 200nm wide 400nm deep
HAR: 2µm wide 6µm deep
Graphene KPFM measurement
Height image: The graphene and structuring in graphene is not visible
Potential image: Potential difference between grapheme and non-graphene is visible
Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear
