Specific Process Knowledge/Etch/Etching of Aluminium
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Revision as of 11:48, 10 August 2017 by Choi (talk | contribs) (→Comparison of Aluminium Etch Methods)
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Etching of Aluminium
Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions.
Comparison of Aluminium Etch Methods
Aluminium Etch | Developer TMAH manual | ICP metal | IBE (Ionfab300+) | |
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Generel description | Wet etch of Al | Wet etch/removal: TMAH Mainly used for removing Al on e-beam resist after e-beam exposure, see process flow here |
Dry plasma etch of Al | Sputtering of Al - pure physical etch |
Etch rate range |
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Etch profile |
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Substrate size |
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Smaller pieces glued to carrier wafer
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Allowed materials | In 'Aluminium Etch' bath:
In beaker:
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