Specific Process Knowledge/Lithography/PMMA
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| CSAR | Positive | AllResist | Standard positive resist, very similar to ZEP520. | Allresist_CSAR62_English.pdf,, CSAR_62_Abstract_Allresist.pdf | Manual Spinner 1 (Laurell), Spin Coater Labspin | XAR-600-546, XAR-600-548, N50, MIBK:IPA | IPA | AR-600-71, 1165 Remover | Process Flow CSAR.docx |
Spin Curves
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.
| AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [1/s2] | Thickness [nm] | St Dev | |||
| 4000 | 2000 | 95.55 | 0.55 | |||
| 5000 | 2000 | 85.50 | 0.92 | |||
| 7000 | 2000 | 72.79 | 1.18 | |||
| AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [1/s2] | Thickness [nm] | St Dev | |||
| 2000 | 2000 | 51.37 | 0.25 | |||
| 3000 | 2000 | 41.97 | 0.24 | |||
| 4000 | 2000 | 36.25 | 0.25 | |||
| 5000 | 2000 | 32.42 | 0.30 | |||
| 6000 | 2000 | 30.17 | 0.29 | |||
| 7000 | 2000 | 28.76 | 0.43 | |||