Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher

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SiO2 can be etched in the Plasma Asher using CF4

Test work done January 2014 by Berit G. Herstrøm @Danchip

SiO2 can be etched in the Plasma Asher using CF4. This gives an isotropic etch.

• Some chemicals of the MVD and the surface reaction
• 
  The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl.