Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher

SiO2 can be etched in the Plasma Asher using CF4

Test work done January 2014 by Berit G. Herstrøm @Danchip

SiO2 can be etched in the Plasma Asher using CF4. This gives an isotropic etch.