Specific Process Knowledge/Lithography/UVExposure
Inclined UV lamp
The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank.
The toll was purchased in February 2009 from Newport company. The exposure lamp has a official name: Oriel Flood Exposure Source, unit 92540. All other parts of equipment: inclined substrate and mask holder with media tank, exhaust box around the tool, timer controller, were designed and build at Danchip workshop.
The incleined substrate and mask holder with a media tank was designed as part of Master Thesis of DTU Nanotech
There are 2 hotplates with temperature range up to 250C, placed in the same fumehood, which can be used for baking before/after spinning.
The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:
Equipment info in LabManager