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10:23, 30 June 2025 User account S232800 talk contribs was created automatically
13:30, 24 June 2025 User account Yanha talk contribs was created automatically
13:33, 23 June 2025 User account Abyadav talk contribs was created automatically
22:14, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 6" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is w...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 4" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is w...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon/ (content was: "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD/Standard recipes, QC limits and results for the 6" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon furnace (t...")
22:06, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD/Standard recipes, QC limits and results for the 4" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furnace (th...")
22:02, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 6" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' ==Standard recipes on the 6" polysilicon furnace (this recipe is being watched in the in the quality assurance program):== {| bor...")
22:01, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 4" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' ==Standard recipe on the 4" polysilicon furnace (this recipe is being watched in the in the quality assurance program):== {| borde...")
21:45, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 6" Polysilicon Furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon fur...")
21:44, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 4" Polysilicon Furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furn...")
17:40, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD (content was: "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the 4"...", and the only contributor was "Pvl" (talk))
17:40, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 6" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon fur...")
17:39, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 4" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furn...")
17:39, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon/ (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the 4" polysilicon furnace|Standard recipes, QC limits and results for the 4" polysilicon...")
17:03, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Gold/Roughness of Au (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Gold/Roughness_of_Au click here]''' ''All contents by DTU Nanolab staff.'' ==Roughness and uniformity of Au layers == '''Experimental''' Au was deposited directly on unprocessed Si wafers (on top of the native oxide), and the deposited layers were thereafter examined w...")
16:53, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Electroplating of nickel (content moved to "Eletcroplating of nickel"-page)
16:36, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Deposition of Chromium (moved to "Roughness of Chromium" (double "Deposition of chromium/Deposition of chromium" was misleading))
16:30, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Roughness of Chromium (Created page with "= Roughness of Cr layers = ''The results and text here is from Katharina Nilson, staff @ Nanolab (then Danchip) (August 2008)'' Cr have been deposited with both E-beam evaporation and sputtering deposition to examine if there are differences in the roughness of the Cr layers. '''Experimental''' Cr depositions have been done directly on unprocessed Si wafers, all depositions has been done in Wordentec (tool decommissioned in 2025). The deposited layers have thereafter...")
16:11, 20 June 2025 Mmat talk contribs created page Decommissioned Equipment (Created page with "=List of decommissioned Equipment= Below is a list of decommissioned equipment that is kept as reference for other Equipment.") Tag: Visual edit: Switched
12:16, 19 June 2025 User account S243699 talk contribs was created automatically
11:42, 18 June 2025 Reet talk contribs created page File:Thermal evap uniformity data.pptx (File uploaded with MsUpload)
11:42, 18 June 2025 Reet talk contribs uploaded File:Thermal evap uniformity data.pptx (File uploaded with MsUpload)
22:57, 17 June 2025 Mmat talk contribs undeleted page LabAdviser:General disclaimer (7 revisions) (link at the bottom of the page needs to be changed to "copyright" before this page can be deleted)
22:49, 17 June 2025 Mmat talk contribs deleted page Sputtering of Ti in Wordentec (content was: "to be deleted, contained no valuable information")
22:48, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Physimeca/Physimeca calibration (content was: "to be deleted, all info moved directoly to Physimeca")
22:43, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/Profiler/Stylus profiler measurement uncertainty (content was: "to be deleted, info moved to Dektaxt XTA")
22:43, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/Profiler/Apex software (content was: "to be deleted, all info moved to https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17", and the only contributor was "Reet" (talk))
22:40, 17 June 2025 Mmat talk contribs deleted page Mask spec (content was: "to be deleted ")
16:24, 17 June 2025 Mmat talk contribs created page 2025-changes (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge click here]''' New Layout for Labadviser: THIS PART IS STILL UNDER CONSTRUCTION == General == * Home *Safety :* Discussion with Sina regarding merging the info with www.nanolab.dtu.dk *Lab...")
15:57, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/ARN7500 (content was: "Information on AR-N 7500 to come.", and the only contributor was "Thope" (talk))
15:57, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBL/EBLsubstratePrep (content copy: https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/EBLsubstratePrep#User_supplied_resists)
15:46, 17 June 2025 Mmat talk contribs created page File:AR-N-7520New.pdf
15:46, 17 June 2025 Mmat talk contribs uploaded File:AR-N-7520New.pdf
14:36, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/B3 Furnace LPCVD TEOS (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS", and the only contributor was "Mdyma" (talk))
14:33, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/B4 Furnace LPCVD PolySilicon (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon", and the only contributor was "Mdyma" (talk))
14:33, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of TEOS using LPCVD (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD", and the only contributor was "Mdyma" (talk))
14:33, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/B2 Furnace LPCVD Nitride (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride", and the only contributor was "Mdyma" (talk))
14:33, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/C4 Furnace Aluminium Anneal (content was: "#REDIRECT Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace", and the only contributor was "Pvl" (talk))
14:32, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/C1 Furnace Anneal oxide (content was: "#REDIRECT Specific Process Knowledge/Thermal Process/C1 Furnace Anneal-oxide", and the only contributor was "Pvl" (talk))
14:32, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/A4 Furnace Phosphorus pre-dep (content was: "#REDIRECT Specific Process Knowledge/Thermal Process/A4 Phosphor Pre-dep furnace", and the only contributor was "Pvl" (talk))
14:29, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/A1 Furnace Boron drive-in (content was: "#REDIRECT Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace", and the only contributor was "Pvl" (talk))
14:27, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/UVExposure Dose (content was: "#REDIRECT Specific Process Knowledge/Lithography/Resist#Exposure_dose <!-- '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure_Dose click here]''' =Exposure dose= Image:AZ photoresists spectral sensitivity - remake v1.png|400x400px|t...", and the only contributor was "Taran" (talk))
14:22, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 (content was: "#REDIRECT Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New", and the only contributor was "Thope" (talk))
14:16, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBSD of TiO2 (content was: "#REDIRECT Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide/IBSD of TiO2", and the only contributor was "BGE" (talk))
14:14, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/XRD/dataconvertion (content was: "#REDIRECT Specific Process Knowledge/Characterization/XRD/dataconversion", and the only contributor was "Khara" (talk))
14:14, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/Film thickness measurement (content was: "#REDIRECT Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants", and the only contributor was "BGE" (talk))
14:13, 17 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Characterization/4-Point Probe (content was: "#REDIRECT Specific Process Knowledge/Characterization/Four-Point Probe", and the only contributor was "Mdyma" (talk))
14:10, 17 June 2025 Mmat talk contribs deleted page SLSII analysis (content was: "#REDIRECT Specific Process Knowledge/Characterization/XRD/SLSII analysis", and the only contributor was "Khara" (talk))