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• 12:23, 15 June 2023 Paphol talk contribs uploaded File:Wet1050 Acceptance test.PNG
• 12:41, 9 February 2022 Paphol talk contribs uploaded File:2022-02-08 10-56-57 Wafer A2 150nm Rel.png
• 12:39, 9 February 2022 Paphol talk contribs uploaded File:2022-02-08 10-56-57 Wafer A2 150nm Abs.png
• 11:52, 9 February 2022 Paphol talk contribs uploaded File:2022-02-08 10-47-35 Wafer E1 117nm Rel.png
• 11:52, 9 February 2022 Paphol talk contribs uploaded File:2022-02-08 10-47-35 Wafer E1 117nm Abs.png
• 11:29, 9 February 2022 Paphol talk contribs uploaded File:E1 furnace.JPG
• 10:38, 4 June 2020 Paphol talk contribs uploaded File:Amor540 24Hours.png (LPCVD Poly furnace Recipe: Amor540, deposition time 24hours, film thickness 2um.)
• 14:41, 7 August 2019 Paphol talk contribs uploaded File:Rs.PNG
• 13:43, 7 August 2019 Paphol talk contribs uploaded File:Probe diagram.PNG
• 13:18, 7 August 2019 Paphol talk contribs uploaded File:Jandel four point probe.PNG
• 11:45, 8 June 2017 Paphol talk contribs uploaded File:Calculation for Wet oxidation for Anneal Oxide(C1) version 2.xlsx (There is more data on the Version 2 (taken from process log))
• 15:18, 3 January 2017 Paphol talk contribs uploaded a new version of File:NiV-DepositionRate-Power.png (NiV deposition rate VS Power)
• 15:10, 3 January 2017 Paphol talk contribs uploaded a new version of File:NiV-Roughness-Power.png (NiV roughness VS Power )
• 08:55, 3 January 2017 Paphol talk contribs uploaded File:NiV-Roughness-Power.png (NiV film Roughness VS sputtering power )
• 08:53, 3 January 2017 Paphol talk contribs uploaded File:NiV-DepositionRate-Power.png (NiV Deposition rate VS Power by Wordentec)
• 15:56, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power150-Pr5mtor.png (SEM NiV by Lesker)
• 15:55, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power150-Pr5mtor.png (AFM NiV by Lesker)
• 12:30, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power250Pressure5e-3.png (SEM NiV by Wordentec)
• 12:30, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power250Pressure1e-2.png (SEM NiV by Wordentec)
• 12:28, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power200Pressure5e-3.png (SEM NiV by Wordentec)
• 12:27, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power200Pressure1e-2.png (SEM NiV by Wordentec)
• 12:25, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power150Pressure5e-3.png (SEM NiV by Wordentec)
• 11:34, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power150Pressure1e-2.png (SEM NiV by Wordentec)
• 11:32, 2 January 2017 Paphol talk contribs uploaded File:SEM-Power100Pressure5e-3.png (SEM NiV by Wordentec)
• 11:31, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power250Pressure5e-3.png (NiV by Wordentec)
• 11:30, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power250Pressure1e-2.png (NiV by Wordentec)
• 11:29, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power200Pressure5e-3.png (NiV by Wordentec)
• 11:28, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power200Pressure1e-2.png (NiV by Wordentec)
• 11:27, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power150Pressure5e-3.png (NiV by Wordentec)
• 11:25, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power150Pressure1e-2.png (NiV by Wordentec)
• 11:21, 2 January 2017 Paphol talk contribs uploaded File:AFM-Power100Pressure5e-3.png (NiV by Wordentec)
• 13:55, 13 October 2015 Paphol talk contribs uploaded File:Boron concentration2.jpg (Boron doped poly vary B2H6 from 3 sccm to 40 sccm Zoom in)
• 13:53, 13 October 2015 Paphol talk contribs uploaded File:Boron concentration.jpg (Boron doped poly vary B2H6 from 3 sccm to 40 sccm )
• 09:45, 8 October 2015 Paphol talk contribs uploaded File:XRD of AlN.png (XRD analysis of AlN )
• 09:42, 8 October 2015 Paphol talk contribs uploaded File:XPS of AlN.png (XPS data of AlN from the Cryofox PVD co-sputter/evaporation)
• 09:39, 8 October 2015 Paphol talk contribs uploaded File:SEM Image of AlN film.png (SEM image of AlN layer and Mo electrode)
• 09:37, 8 October 2015 Paphol talk contribs uploaded File:Process parameters for AlN.png (Parameters used in Cryofox PVD co-sputter/evaporation )
• 14:19, 10 September 2015 Paphol talk contribs uploaded File:Boron content.jpg (Boron concentration by SIMS Done by Thomas Pedersen)
• 09:34, 19 February 2015 Paphol talk contribs uploaded File:Boron doped poly thickness .png (Poly-Si thickness at 7 sccm and 30 sccm B2H6 Flow. Result from Trine H. Christensen DTU Space)
• 09:30, 19 February 2015 Paphol talk contribs uploaded File:Rs AmorBor vs PolyBor .png (Sheet resistance on Boron doped poly-si using "POLYBOR" recipe, deposition time : 30 minutes, B2H6 flow at 7 sccm and 30 sccm, anneal : 950C 1 hour and Boron doped a-Si using "AMORBOR" recipe, Deposition time : 75 minutes, B2H6 flow at 7sccm, anneal: 9...)
• 15:04, 17 February 2015 Paphol talk contribs uploaded File:Rs on 4in boron doped poly .png (Sheet resistance on Boron doped poly-si using "POLYBOR" recipe, deposition time : 30 minutes, B2H6 flow at 7 sccm and 30 sccm, anneal : 950C 1 hour. Result from Trine H. Christensen DTU Space)
• 10:25, 11 February 2015 Paphol talk contribs uploaded a new version of File:Doped poly.pdf
• 09:50, 11 February 2015 Paphol talk contribs uploaded File:Doped poly.pdf (Recipe "DOPEPOLY" Deposition time : 30 minutes Polysilicon thickness :104 nm Substrate : 110nm Silicon dioxide on N-type si(100))
• 11:57, 30 September 2014 Paphol talk contribs uploaded File:RASIRC Steam generator.pdf (Integrated unit for precise flow rate steam generation and delivery)
• 11:35, 29 September 2014 Paphol talk contribs uploaded File:Calculation for Wet oxidation for Anneal Oxide(C1).xlsx (Know the expected oxide thickness, calculate the oxidation time. Or Know the oxidation time, calulate the oxide thinkness.)
• 11:29, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig5.png (The percent of film non-uniformity variation with growth time in different temperature. (left) Over the boat and (right) over the wafer)
• 11:27, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig4.png (Silicon dioxide thickness variation with growth time (from 0 to 720 minutes) in different temperature)
• 11:26, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig3.png (The percent different of the silicon dioxide thickness at the steamer flow rate at 10 and 25 l/min variation with temperature)
• 11:26, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig2.png (The average silicon dioxide thickness and the percent of film non-uniformity over the wafer variation with process time, steamer flow rate and temperature.)
• 11:19, 29 September 2014 Paphol talk contribs uploaded File:Steamer process develop fig1.png (The average silicon dioxide thickness and the percent of film non-uniformity over the boat variation with process time, steamer flow rate and temperature.)