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- 11:53, 9 February 2026 User account Yanprin talk contribs was created automatically
- 22:28, 7 February 2026 User account S225221 talk contribs was created automatically
- 01:20, 7 February 2026 User account Patdem talk contribs was created automatically
- 17:33, 5 February 2026 User account S234671 talk contribs was created automatically
- 15:03, 4 February 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask (content before blanking was: "==Etching SiO2 with DUV resist mask using EM coils== {{CC-bghe2}} *Removing the H2 from the recipe to get less redeposition @ 200W platen power, EM:02/30A <gallery caption="Recipe name: SiO2_res, Recipe no. 10+EM+edit coils: C09975 coil_2500W, platen:200W, EM:02/30A, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:0sccm, 3:56 min " perrow="5"> File:C09975_00.jpg File:C09975_02.jpg File:C09975_03.jpg File:C09975_04.jpg File:C09975_05.jpg </gallery>")
- 12:36, 4 February 2026 User account Qiashi talk contribs was created automatically
- 11:36, 4 February 2026 Prakus talk contribs created page File:Loop test with normal prg8 test 4 goodbondsbutlittle low US.png (File uploaded with MsUpload)
- 11:36, 4 February 2026 Prakus talk contribs uploaded File:Loop test with normal prg8 test 4 goodbondsbutlittle low US.png (File uploaded with MsUpload)
- 11:20, 4 February 2026 Prakus talk contribs created page File:Test 020226.png (File uploaded with MsUpload)
- 11:20, 4 February 2026 Prakus talk contribs uploaded File:Test 020226.png (File uploaded with MsUpload)
- 10:04, 4 February 2026 User account S234461 talk contribs was created automatically
- 17:11, 3 February 2026 User account Hemj talk contribs was created automatically
- 16:30, 3 February 2026 User account Evanorf talk contribs was created automatically
- 15:25, 29 January 2026 Jesyup talk contribs uploaded a new version of File:IMG 20230228 113045.jpg (Cropped)
- 15:24, 29 January 2026 Jesyup talk contribs uploaded a new version of File:IMG 20230228 113020.jpg (Cropped)
- 15:16, 29 January 2026 Jesyup talk contribs reverted File:IMG 20230228 113020.jpg to an old version (Reverted to version as of 11:44, 28 February 2023 (CET))
- 14:59, 29 January 2026 Jesyup talk contribs uploaded a new version of File:IMG 20230228 113020.jpg (Cropped)
- 14:16, 26 January 2026 User account Finta talk contribs was created automatically
- 09:51, 26 January 2026 User account Rikan talk contribs was created automatically
- 13:16, 25 January 2026 User account Beavi talk contribs was created automatically
- 18:16, 23 January 2026 User account Cralo talk contribs was created automatically
- 15:44, 21 January 2026 Prakus talk contribs created page File:Au wire 011.png (File uploaded with MsUpload)
- 15:44, 21 January 2026 Prakus talk contribs uploaded File:Au wire 011.png (File uploaded with MsUpload)
- 15:44, 21 January 2026 Prakus talk contribs created page File:Au wire 004.png (File uploaded with MsUpload)
- 15:44, 21 January 2026 Prakus talk contribs uploaded File:Au wire 004.png (File uploaded with MsUpload)
- 15:06, 21 January 2026 Prakus talk contribs created page File:Au wire 024.png (File uploaded with MsUpload)
- 15:06, 21 January 2026 Prakus talk contribs uploaded File:Au wire 024.png (File uploaded with MsUpload)
- 15:02, 21 January 2026 Prakus talk contribs created page File:Au wire 009.png (File uploaded with MsUpload)
- 15:02, 21 January 2026 Prakus talk contribs uploaded File:Au wire 009.png (File uploaded with MsUpload)
- 14:57, 21 January 2026 Prakus talk contribs created page File:Au wire 020.png (File uploaded with MsUpload)
- 14:57, 21 January 2026 Prakus talk contribs uploaded File:Au wire 020.png (File uploaded with MsUpload)
- 14:57, 21 January 2026 Prakus talk contribs created page File:Au wire 006.png (File uploaded with MsUpload)
- 14:57, 21 January 2026 Prakus talk contribs uploaded File:Au wire 006.png (File uploaded with MsUpload)
- 13:49, 20 January 2026 Prakus talk contribs created page File:Au wire 006.tif (File uploaded with MsUpload)
- 13:49, 20 January 2026 Prakus talk contribs uploaded File:Au wire 006.tif (File uploaded with MsUpload)
- 13:44, 19 January 2026 User account Diomelo talk contribs was created automatically
- 14:39, 16 January 2026 User account Idahv talk contribs was created automatically
- 17:14, 14 January 2026 User account Fedca talk contribs was created automatically
- 10:39, 14 January 2026 Jehem talk contribs created page File:Developer ebeam v1.jpg
- 10:39, 14 January 2026 Jehem talk contribs uploaded File:Developer ebeam v1.jpg
- 13:30, 13 January 2026 Jehem talk contribs created page Specific Process Knowledge/Lithography/UVExposure/aligner inclinedUV (Created page with "==Inclined UV Lamp== 300x300px|right|thumb|Inclined UV lamp is placed in CX-1 The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can also be used to make an inclined exposure in air or in the media tank. The tool was purchased in February 2009 from Newport. The exposure lamp official name is Oriel Flood Exposur...")
- 12:24, 13 January 2026 User account Macolo talk contribs was created automatically
- 12:10, 13 January 2026 Jehem talk contribs created page File:ManualTMAHdeveloper uniformity v1.png
- 12:10, 13 January 2026 Jehem talk contribs uploaded File:ManualTMAHdeveloper uniformity v1.png
- 12:09, 13 January 2026 Jehem talk contribs created page File:ManualTMAHdeveloper developRate v1.png
- 12:09, 13 January 2026 Jehem talk contribs uploaded File:ManualTMAHdeveloper developRate v1.png
- 15:44, 12 January 2026 User account Yingan talk contribs was created automatically
- 12:37, 12 January 2026 Jehem talk contribs created page Specific Process Knowledge/Lithography/Strip/plasmaAsher04 processDevelopment (Created page with "=Process gas ratio for plasma asher 4 & 5= 400px|thumb|Ashing rate as function of gas mix ratio when processing a single 100 mm wafer and when processing a full boat with 25 wafers. The green area (~50% N<sub>2</sub>) covers the optimum range for both situations.|right The ashing rate is related to the gas mix, usually expressed as percentage of nitrogen of the total amount of gas. Process development tests found that a gas mix of 50% nitrogen...")
- 12:20, 12 January 2026 Jehem talk contribs created page Specific Process Knowledge/Lithography/Strip/wetBench06and07 (Created page with "=Overview of wet bench 06 and 07= {| class="wikitable" |- ! !! Resist Strip !! Lift-off |- ! scope=row style="text-align: left;" | Process | Wet resist strip || Metal lift-off process |- ! scope=row style="text-align: left;" | Chemical | Remover 1165 (NMP) || Remover 1165 (NMP) |- ! scope=row style="text-align: left;" | Process tempera...")
- 12:20, 12 January 2026 Jehem talk contribs created page Specific Process Knowledge/Lithography/Strip/resistStrip (Created page with "=Resist Strip= 400px|thumb|Resist strip bench in D-3 This resist strip is only for wafers without metal and SU-8. There are one Remover 1165 bath for stripping and one IPA bath for rinsing. '''Here are the main rules for resist strip use:''' *Place the wafers in a wafer holder and put them in the first bath for 10 min, this time is depending how much resist you have on the surface. *After the strip rinse your wafers in the IPA bath for 2-3...")