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22:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR 60nm makei XRR MoSi cosputter 26W 140W 3mTorr PC1 Src1Src3 200C 20250716.png (File uploaded with MsUpload)
22:46, 16 July 2025 Eves talk contribs created page File:Eves XRR 60nm makei XRR MoSi cosputter 20W 140W 3mTorr PC1 Src1Src3 RT 20250716.png (File uploaded with MsUpload)
22:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR 60nm makei XRR MoSi cosputter 20W 140W 3mTorr PC1 Src1Src3 RT 20250716.png (File uploaded with MsUpload)
22:46, 16 July 2025 Eves talk contribs created page File:Eves XRR 60nm makei XRR MoSi cosputter 20W 140W 3mTorr PC1 Src1Src3 300C 20250716.png (File uploaded with MsUpload)
22:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR 60nm makei XRR MoSi cosputter 20W 140W 3mTorr PC1 Src1Src3 300C 20250716.png (File uploaded with MsUpload)
22:46, 16 July 2025 Eves talk contribs created page File:Eves XRR 60nm makei XRR MoSi cosputter 20W 140W 3mTorr PC1 Src1Src3 200C 20250716.png (File uploaded with MsUpload)
22:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR 60nm makei XRR MoSi cosputter 20W 140W 3mTorr PC1 Src1Src3 200C 20250716.png (File uploaded with MsUpload)
22:41, 16 July 2025 Eves talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of MoSi (Created page with "Molybdenum silicide is particularly attractive for optical coatings because co-sputtering Mo with Si allows precise control of MoSi stoichiometry—and, in turn, the film’s refractive index at the design wavelength. MoSi alloy can be deposited by DC co-sputtering in either Sputter-System Metal-Oxide (PC1) or Sputter-System Metal-Nitride (PC3)—collectively referred to as the Cluster Lesker. The process uses two 3-inch targets: *Mo (unbonded) *Si (indium-bonded) A...")
19:46, 16 July 2025 Eves talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1 (Created page with "This page is written by Evgeniy Shkondin @DTU Nanolab if nothing else is stated. All images and photos on this page belongs to DTU Nanolab. The fabrication and characterization described below were conducted in 2025 by Evgeniy Shkondin. This page presents the results of Mo deposition using DC sputtering in Sputter-System Metal-Oxide(PC1), now commonly known as "Cluster Lesker". The deposition target is Mo 3-inch. Source #3 (DC -...")
19:46, 16 July 2025 Eves talk contribs created page File:Eves XRR Mo 300W 3mTorr 100s PC1 Src3 Dc RT.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR Mo 300W 3mTorr 100s PC1 Src3 Dc RT.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs created page File:Eves XRR Mo 100W 3mTorr 300s PC1 Src3 Dc RT.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR Mo 100W 3mTorr 300s PC1 Src3 Dc RT.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs created page File:Eves Mo GiXRD may 2025.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs uploaded File:Eves Mo GiXRD may 2025.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs created page File:Eves Mo Deposition rate vs Power.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs uploaded File:Eves Mo Deposition rate vs Power.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs created page File:Eves XRR Mo 500W 3mTorr 50s PC1 Src3 Dc RT.png (File uploaded with MsUpload)
19:46, 16 July 2025 Eves talk contribs uploaded File:Eves XRR Mo 500W 3mTorr 50s PC1 Src3 Dc RT.png (File uploaded with MsUpload)
14:18, 14 July 2025 Bghe talk contribs created page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Silicon Nitride Etch (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch) click here]''' =THIS PAGE IS UNDER CONSTRUCTION200px=")
10:45, 11 July 2025 User account Nimart talk contribs was created automatically
21:53, 7 July 2025 Reet talk contribs created page File:BlankSi 6in center-2-altlevel2.PNG (File uploaded with MsUpload)
21:53, 7 July 2025 Reet talk contribs uploaded File:BlankSi 6in center-2-altlevel2.PNG (File uploaded with MsUpload)
21:53, 7 July 2025 Reet talk contribs created page File:Si 6 in left 50umprsec aveof2.png (File uploaded with MsUpload)
21:53, 7 July 2025 Reet talk contribs uploaded File:Si 6 in left 50umprsec aveof2.png (File uploaded with MsUpload)
14:23, 7 July 2025 Reet talk contribs created page File:Dektak XT and P17 scan flatness comparison summer 2025.pptx (File uploaded with MsUpload)
14:23, 7 July 2025 Reet talk contribs uploaded File:Dektak XT and P17 scan flatness comparison summer 2025.pptx (File uploaded with MsUpload)
13:10, 7 July 2025 Reet talk contribs created page Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty (Created page with " =Stylus Profiler Measurement Accuracy= The accuracy of a height measurement with the profiler depends on the measurement settings, the sample, the instrument calibration and the resolution. ===Adjust Measurement Settings for your Sample=== Both the force setting and the scan speed are important: Too high force may compress a soft material like Al, Au or some polymers, while too low force may lead to the stylus "jumping" over features, especially if the scan speed is hi...")
16:49, 3 July 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thermal Process/Oxidation/Oxidation on III-V oxidation furnace (C2) (slated for deletion by PEVO)
23:04, 1 July 2025 Mmat talk contribs created page Category:346 (Created page with "This category includes all pages related to DTU Nanolab building 346/347.")
10:23, 30 June 2025 User account S232800 talk contribs was created automatically
13:30, 24 June 2025 User account Yanha talk contribs was created automatically
13:33, 23 June 2025 User account Abyadav talk contribs was created automatically
22:14, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 6" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is w...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 4" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is w...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon/ (content was: "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the...", and the only contributor was "Mmat" (talk))
22:08, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD/Standard recipes, QC limits and results for the 6" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon furnace (t...")
22:06, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD/Standard recipes, QC limits and results for the 4" polysilicon furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furnace (th...")
22:02, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 6" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' ==Standard recipes on the 6" polysilicon furnace (this recipe is being watched in the in the quality assurance program):== {| bor...")
22:01, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 4" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' ==Standard recipe on the 4" polysilicon furnace (this recipe is being watched in the in the quality assurance program):== {| borde...")
21:45, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 6" Polysilicon Furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon fur...")
21:44, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 4" Polysilicon Furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furn...")
17:40, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD (content was: "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the 4"...", and the only contributor was "Pvl" (talk))
17:40, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 6" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipes on the 6" polysilicon fur...")
17:39, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon//Standard recipes, QC limits and results for the 4" polysilicon furnace (Created page with " '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace click here]''' Unless otherwise stated, this page is written by DTU Nanolab internal ==Standard recipe on the 4" polysilicon furn...")
17:39, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Polysilicon/ (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD) click here]''' ==Deposition of polysilicon using LPCVD== /Standard recipes, QC limits and results for the 4" polysilicon furnace|Standard recipes, QC limits and results for the 4" polysilicon...")
17:03, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Gold/Roughness of Au (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Gold/Roughness_of_Au click here]''' ''All contents by DTU Nanolab staff.'' ==Roughness and uniformity of Au layers == '''Experimental''' Au was deposited directly on unprocessed Si wafers (on top of the native oxide), and the deposited layers were thereafter examined w...")
16:53, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Electroplating of nickel (content moved to "Eletcroplating of nickel"-page)
16:36, 20 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Deposition of Chromium (moved to "Roughness of Chromium" (double "Deposition of chromium/Deposition of chromium" was misleading))
16:30, 20 June 2025 Mmat talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Roughness of Chromium (Created page with "= Roughness of Cr layers = ''The results and text here is from Katharina Nilson, staff @ Nanolab (then Danchip) (August 2008)'' Cr have been deposited with both E-beam evaporation and sputtering deposition to examine if there are differences in the roughness of the Cr layers. '''Experimental''' Cr depositions have been done directly on unprocessed Si wafers, all depositions has been done in Wordentec (tool decommissioned in 2025). The deposited layers have thereafter...")