Specific Process Knowledge/Thermal Process

Choose a process type

A1 Furnace Boron drive-in - For oxidation of new wafers and for drive in of Boron pre-dep
A2 Furnace Boron pre-dep - Dope with Boron: For predeposition of Boron on wafers
A3 Furnace Phosphorus drive-in - For oxidation of new wafers and for drive in of Phosphorus pre-dep
A4 Furnace Phosphorus pre-dep - Dope with Phosphorus: For predeposition of Phosphorus on wafers
C1 Furnace Anneal Oxide - For oxidation and annealing, up to 6" wafer
C2 Furnace Gate Oxide - For growing of Gate Oxide on new wafers
C3 Furnace Anneal Bond - For annealing and annealing of bonded wafers
C4 Furnace Aluminium Anneal - For oxidation and annealing of wafers containing Aluminium
Furnace Noble - For non-clean annealing
Furnace APOX - Furnace for growing very thick oxide
Jipelec RTP - For Rapid Thermal Anneal of III-V materials and Silicon based material