Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope

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Process optimization using the Picoscope

Before going into details on why it makes sense to optimize the processes using the picoscope process monitoring, we need to have a look at how this is usually done.

Standard process parameter monitoring

The original standard recipes on Pegasus 1 differ in many ways. The second step of one of them is listed below:

Process A Step 2 parameters
Parameter Etch Dep
Gas flow (sccm) SF6 350 (1.5 s), 550 C4F8 200
Cycle time (secs) 7.0 4.0
Pressure (mtorr) 25 (1.5 s), 150 25
Coil power (W) 2800 2000
Platen power (W) 140 (1.5) 45 0
Common Temperature 20 degs

When running any recipe on the SPTS Pro software, a set of process parameters are recorded as the process runs. This data can be accessed later by looking up the datalog. Which parameters are recorded is dictated by the socalled logging recipe that is selected for every process recipe. The list of possible parameters to include in a logging recipe is long and is comprised of both input parameters such as 'Coil forward power demand' and 'SF6 flow setpoint', and measured values such as 'Platen temperature' and 'Platen DC Bias'. During the process itself, one can also activate the 'Trace' to monitor the process parameters in real time.

To the left in the figure below, some of the most important process parameters are shown for a process run of the recipe Process A.

Above, one can see the multiplexing of the Bosch process by alternation of the gas flows of SF6 (that has flow initially at 350 sccm in the break for the first 1.5 second then 550 sccm for 5.5 seconds in the main etch phase) and C4F8 (at 200 sccm in the dep phase) according to the process recipe table above. Below, the pressure alternates between 25 mtorr (dep and break) and 150 mtorr (main). The Platen Electrode DC Bias (the electrostatic potential difference between the plasma and the wafer electrode that drives the ion bombardment in the etch process) is generated by the Platen Power at 140 W in the break and 45 W in the main etch.

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4 cycles of the recipe PrD4 recorded with the Picoscope
4 cycles of the recipe PrD4 recorded with the SPTS software
4 cycles of the recipe Process A recorded with the Picoscope
4 cycles of the recipe PrD4 recorded with the SPTS software