Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/NewProcessD
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 15/12-2014 | 4" Wafer with AZ resist | Travka50 pattern | Si / 50 % | Pegasus/jmli | 20 minute TDESC clean | danchip/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes | S004743 | New showerhead |
File:S00743-01.jpg File:S00743-02.jpg File:S00743-03.jpg File:S00743-04.jpg File:S00743-05.jpg File:S00743-06.jpg File:S00743-06.jpg File:S00743-07.jpg |
