Specific Process Knowledge/Lithography/Aligners/MAvsMLA

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Slides presented at NNUM in Uppsala 2026

MA6 vs MLA 2026_v09

Additional data

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AZ 5214E

Resolution and yield

• Aligner: Maskless 02 (MLA2)
• Aligner: MA6-2
• Aligner: MA6-1

Resist profile (sidewall angle and linewidth)

Width of 2µm line vs. exposure dose.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).

Sidewall angle vs. exposure dose.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).

Linewidth and sidewall angle vs. defocus value of patterns exposed in Aligner: Maskless 02 (MLA2) at 95mJ/cm².
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.

AZ MiR 701

Resist profile (sidewall angle and linewidth)

• Aligner: Maskless 02 (MLA2)
• Aligner: MA6-2

AZ nLOF 2020

Resist profile (sidewall angle and linewidth)

• Aligner: Maskless 01 (MLA1)
• Aligner: Maskless 02 (MLA2)
• Aligner: MA6-2