Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-1

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Unless otherwise stated, the content of this page was created by the dry etch group at DTU Nanolab

DRIE-Pegasus 1

The DRIE-Pegasus 1 load lock and cassette loader in the Nanolab cleanroom A-1. Photo: DTU Nanolab internal

The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:

Equipment info in LabManager

Process information

Standard recipes

• Process A (Large trench): 80 µm wide trench etched down to a depth of 150 µm

• Process B (Via etch): 30 µm diameter via etched down to a depth of 100 µm

• Process C (Nano etch): 50-300 nm posts

• Process D (Micro stamp) Please note that this process has changed

• SOI etch

Hardware changes

A few hardware modifications have been made on the Pegasus since it was installed in 2010. The changes are listed below.

• Change of showerhead in December 2014

• Addition of Picoscope oscilloscope system for process monitoring in February 2017

• Addition of a Claritas optical endpoint system in June 2018

Other etch processes

• DREM processes

• Continuous nanostructure etches including nano1.42

• Etch processes with DUV masks

• Isotropic etches

More processes, such as for DUV resist, are currently being developed, but they are not quite 'ready for publication' at LabAdviser so please contact Jonas (mailto:jmli@dtu.dk) for more information.

Advanced Processing - Henri Jansen style

• Etch silicon nanostructures
• Etch high aspect ratio silicon microstructures
• Etch 3 dimensional silicon microstructures
• Etch black silicon
• Using OES to monitor etch process

Wafer bonding

To find information on how to bond wafers or chips to a carrier wafer, click here.

Characterisation of etched trenches

Comparing differences in etched trenches requires a set of common parameters for each trench. Click HERE to find more information about the parameters used on the DRIE-Pegasus process development.

Internal Nanolab Process log for Pegasus 1

Process log at Nanolab [1]