Specific Process Knowledge/Etch/Wet Chromium Etch
Feedback to this page: click here
Wet etching of Chromium
Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom B-1 or D-3. You can see the APV here.
We use the following solution to etch chromium:
- Commercial chromium etch (Chrome Etch 18). You can see the KBA here
The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the etch rate is around 150 nm/min.
Overview of the chromium etch process
| Chromium etch 1 | |
|---|---|
| General description |
Etch of chromium |
| Link to safety APV and KBA | see APV here. |
| Chemical solution | Chrome Etch 18 |
| Process temperature | Room temperature |
| Possible masking materials | Photoresist (1.5 µm AZ5214E) |
| Etch rate | ~ 150 nm/min at 22°C |
| Batch size | 1-7 4" wafers at a time |
| Size of substrate | Any size and number that can go inside the beaker in use |
| Allowed materials | No restrictions.
Make a note on the beaker of which materials have been processed. |