Specific Process Knowledge/Lithography/PMMA

Resist	Polarity	Manufacturer	Comments	Technical reports	Spinner	Thinner	Developer	Rinse	Remover	Process flows (in docx-format)
PMMA	Positive	AllResist	We have various types of PMMA in the cleanroom. Please contact Lithography for information.		See table here	Anisole	MIBK:IPA (1:3), IPA:H2O	IPA	acetone/1165	Spin Curves The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC. Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev 4000 2000 95.55 0.55 5000 2000 85.50 0.92 7000 2000 72.79 1.18 AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC. Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev 2000 2000 51.37 0.25 3000 2000 41.97 0.24 4000 2000 36.25 0.25 5000 2000 32.42 0.30 6000 2000 30.17 0.29 7000 2000 28.76 0.43