Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing

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Multipurpose annealing furnace

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The ATV Furnace

Multipurpose annealing furnace. Positioned in cleanroom B-1
Boat with wafer for the multipurpose annealing furnace.

The Multipurpose annealing furnace it made by the company ATV Technologie, and it was installed in the cleanroom in 2015.

The purpose of the Multipurpose annealing furnace is annealing and dry oxidation of different samples and resist pyrolysis. Annealling and resist pyrolysis can be done in vaccum or at atmospheric pressure, in a N2, H2 or a mixture of the two gasses.

Is is possible to change all quartz ware in the furnace (the furnace tube, the door sealing and the wafer boat). A the moment Danchip is has three different sets of quartz ware:

  • Clean: Dedicated for clean samples that have been RCA cleaned
  • Metal: Dedicated for different samples that cannot be RCA cleaned. Also samples with metals are allowed in the furnace, when this quartz set is mounted
  • Resist pyrolysis: Dedicated for resist pyrolysis.

Please note that all new materials have to be approved by the Thin Film group (thinfilm@danchip.dtu.dk) before they are allowed in the furnace.

The furnace tube is heated by use on 12 long heaters situated along the furnace tube and two flat heaters situated in the ends of the furnace tube. The this way the temperature will be very uniform everywhere in the furnace tube. The heating can be done very fast, up to 30 oC/min. For atmospheric pressure processes the maximum temperature is 1100 oC, and for vacuum processes the maximum temperature is 1050 oC. Cooling is done (rather slowly) by use of cooling fans.

For resist pyrolysis, samples with different resist layers are heated up to maximum 1100 oC in a nitrogen atmosphere. At high temperatures carbon is formed by pyrolysis of the resist. In this way conductive structures can be made from a resist patterned sample. If oxygen from the air or from outgassing of the resist is present in the furnace, the resist layer will be removed, thus it is important to evacuate the furnace and flush it with nitrogen, before a high temperature for resist pyrolysis is obtained. Pyrolysis of a large amount of resist may also be a problem due to resist outgassing.


The user manual, technical information and contact information can be found in LabManager:

Furnace: Multipurpose annealing

Process information

Overview of the performance of the ATV furnace and process related parameters

Purpose
  • Dry oxidation of silicon
  • Annealing in N2, H2 or a mixture of the two gasses
  • Pyrolysis of different resists
Performance Film thickness
  • Dry oxidation: 50 Å to ~200 nm Å SiO2 (it takes too long to grow a thicker layer)
Process parameter range Process Temperature
  • No vacuum: 25 oC - 1100 oC
  • Vacuum: 25 oC - 1050 oC
Process pressure
  • 1 atm
  • Vacuum down to ~0.1 mbar (depends on gas flow)
Gasses on the system
  • N2: 20 sccm
  • O2: 10 sccm
  • H2: 5 sccm (max 2 sccm for vacuum processes)
  • N2-H2 mix: 10 sccm
Substrates Batch size
  • 1-30 50 mm, 100 mm or 150 mm wafers per run
  • 1-50 200 mm wafers per run (not possible with all quartz sets)
  • Smaller samples (placed in a Si carrier wafer)
Substrate materials allowed
  • Depends on the quartz set
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