Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/Workspaces
Appearance
Feedback to this page: click here
THIS PAGE IS UNDER CONSTRUCTION
Roughness measurements High aspect ratio samples Steep steps - but no high aspect ratio Topographic measurement with no or very small steps (<?)
Comparison method 1 and method 2 for the process
| Roughness measurements | Topographic measurements with no steep steps | Steep steps but no high aspect ratio | High aspect ratio measurements | |
|---|---|---|---|---|
| Generel description | Generel description - Roughness measurements | Generel description - | ||
| Recommended probes |
|
|
||
| Recommended experiment/Workspace |
|
|
||
| Substrate size |
|
|
||
| Allowed materials |
|
|