Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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*1-12 4" wafers or 1-4 6" wafer or many smaller chips per run | *1-12 4" wafers or 1-4 6" wafer or many smaller chips per run | ||
*Deposition time for 1 and 3 wafers | *Deposition time for 1 and 3 wafers is the same | ||
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*1 50mm wafer | *1 50mm wafer | ||