Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions
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==Test of Phosphorus Predep furnace== | |||
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====Purpose==== | |||
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To study the coherence between the temperature and time for doping with phosphorus in DTU-Danchip Phosphorus Predep furnace (A4). | |||
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====Study setup==== | |||
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Revision as of 10:12, 25 February 2013
The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.
In preparation
THIS PAGE IS UNDER CONSTRUCTION
Test of Phosphorus Predep furnace
Purpose
To study the coherence between the temperature and time for doping with phosphorus in DTU-Danchip Phosphorus Predep furnace (A4).
Study setup