Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions
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==Test of Phosphorus Predep furnace== | |||
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====Purpose==== | |||
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To study the coherence between the temperature and time for doping with phosphorus in DTU-Danchip Phosphorus Predep furnace (A4). | |||
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====Study setup==== | |||
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Revision as of 11:12, 25 February 2013
The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.
In preparation
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Test of Phosphorus Predep furnace
Purpose
To study the coherence between the temperature and time for doping with phosphorus in DTU-Danchip Phosphorus Predep furnace (A4).
Study setup