Specific Process Knowledge/Thermal Process: Difference between revisions
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== Choose an equipment to use == | == Choose an equipment to use == | ||
*[[/A1 | *[[/A1 Bor Drive-in furnace|A1 Bor Drive-in furnace]] - ''For oxidation of new wafers and for drive-in of Boron pre-dep'' | ||
*[[/A2 | *[[/A2 Bor Pre-dep furnace|A2 Bor Pre-dep furnace]] - ''Dope with Boron: For predeposition of Boron on wafers'' | ||
*[[/A3 | *[[/A3 Phosphor Drive-in furnace|A3 Phosphor Drive-in furnace]] - ''For oxidation of new wafers and for drive in of Phosphorus pre-dep'' | ||
*[[/A4 Furnace Phosphorus pre-dep|A4 Furnace Phosphorus pre-dep]] - ''Dope with Phosphorus: For predeposition of Phosphorus on wafers'' | *[[/A4 Furnace Phosphorus pre-dep|A4 Furnace Phosphorus pre-dep]] - ''Dope with Phosphorus: For predeposition of Phosphorus on wafers'' | ||
*[[/C1 Furnace Anneal Oxide|C1 Furnace Anneal Oxide]] - ''For oxidation and annealing, up to 6" wafer'' | *[[/C1 Furnace Anneal Oxide|C1 Furnace Anneal Oxide]] - ''For oxidation and annealing, up to 6" wafer'' | ||